Publication

Fabrication of slot waveguide cavity for sensing application

Hans Peter Herzig, Qing Tan, Armando Cosentino
2010
Conference Papers

Abstract

The fabrication of a slot waveguide cavity oriented to sensing application is demonstrated. The choice of materials and the development of the process flow steps, including E-beam lithography (EBL) and metal lift-off of a single thin layer, are illustrated and discussed to obtain 30 nm width slots in a thin gold layer.

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Hans Peter Herzig, Qing Tan, Armando Cosentino
2010
Conference Papers

Abstract

Official source

Related concepts (18)

Photolithography

In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.

Thin film

A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering.

Interference lithography

Interference lithography (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. The basic principle is the same as in interferometry or holography. An interference pattern between two or more coherent light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima.

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Fabrication of slot waveguide cavity for sensing application

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