PhotolithographyIn integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.
Thin filmA thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering.
Interference lithographyInterference lithography (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. The basic principle is the same as in interferometry or holography. An interference pattern between two or more coherent light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima.
Flow process chartThe flow process chart is a graphical and symbolic representation of the activities performed on the work piece during the operation in industrial engineering. The first structured method for documenting process flow, e.g., in flow shop scheduling, the flow process chart, was introduced by Frank and Lillian Gilbreth to members of ASME in 1921 as the presentation "Process Charts, First Steps in Finding the One Best Way to Do Work". The Gilbreths' tools quickly found their way into industrial engineering curricula.
Control-flow diagramA control-flow diagram (CFD) is a diagram to describe the control flow of a business process, process or review. Control-flow diagrams were developed in the 1950s, and are widely used in multiple engineering disciplines. They are one of the classic business process modeling methodologies, along with flow charts, drakon-charts, data flow diagrams, functional flow block diagram, Gantt charts, PERT diagrams, and IDEF. A control-flow diagram can consist of a subdivision to show sequential steps, with if-then-else conditions, repetition, and/or case conditions.
Extreme ultraviolet lithographyExtreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography technology used in semiconductor device fabrication to make integrated circuits (ICs). It uses extreme ultraviolet (EUV) wavelengths near 13.5 nm, using a laser-pulsed tin (Sn) droplet plasma (Sn ions in the ionic states from Sn IX to Sn XIV give photon emission spectral peaks around 13.5 nm from 4p64dn - 4p54dn+1 + 4dn-14f ionic state transitions.), to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist.
Plasma etchingPlasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma.
Data-flow diagramA data-flow diagram is a way of representing a flow of data through a process or a system (usually an information system). The DFD also provides information about the outputs and inputs of each entity and the process itself. A data-flow diagram has no control flowthere are no decision rules and no loops. Specific operations based on the data can be represented by a flowchart. There are several notations for displaying data-flow diagrams. The notation presented above was described in 1979 by Tom DeMarco as part of structured analysis.
Flow diagramFlow diagram is a collective term for a diagram representing a flow or set of dynamic relationships in a system. The term flow diagram is also used as a synonym for flowchart, and sometimes as a counterpart of the flowchart. Flow diagrams are used to structure and order a complex system, or to reveal the underlying structure of the elements and their interaction. The term flow diagram is used in theory and practice in different meanings. Most commonly the flow chart and flow diagram are used in an interchangeable way in the meaning of a representation of a process.
Nanoimprint lithographyNanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
Waveguide filterA waveguide filter is an electronic filter constructed with waveguide technology. Waveguides are hollow metal conduits inside which an electromagnetic wave may be transmitted. Filters are devices used to allow signals at some frequencies to pass (the passband), while others are rejected (the stopband). Filters are a basic component of electronic engineering designs and have numerous applications. These include selection of signals and limitation of noise.
Waveguide (radio frequency)In radio-frequency engineering and communications engineering, waveguide is a hollow metal pipe used to carry radio waves. This type of waveguide is used as a transmission line mostly at microwave frequencies, for such purposes as connecting microwave transmitters and receivers to their antennas, in equipment such as microwave ovens, radar sets, satellite communications, and microwave radio links. The electromagnetic waves in a (metal-pipe) waveguide may be imagined as travelling down the guide in a zig-zag path, being repeatedly reflected between opposite walls of the guide.
Remote sensingRemote sensing is the acquisition of information about an object or phenomenon without making physical contact with the object, in contrast to in situ or on-site observation. The term is applied especially to acquiring information about Earth and other planets. Remote sensing is used in numerous fields, including geophysics, geography, land surveying and most Earth science disciplines (e.g. exploration geophysics, hydrology, ecology, meteorology, oceanography, glaciology, geology); it also has military, intelligence, commercial, economic, planning, and humanitarian applications, among others.
Thin-film solar cellThin-film solar cells are made by depositing one or more thin layers (thin films or TFs) of photovoltaic material onto a substrate, such as glass, plastic or metal. Thin-film solar cells are typically a few nanometers (nm) to a few microns (μm) thick–much thinner than the wafers used in conventional crystalline silicon (c-Si) based solar cells, which can be up to 200 μm thick. Thin-film solar cells are commercially used in several technologies, including cadmium telluride (CdTe), copper indium gallium diselenide (CIGS), and amorphous thin-film silicon (a-Si, TF-Si).
Atomic layer depositionAtomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants"). These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. A thin film is slowly deposited through repeated exposure to separate precursors.
Distributed-element circuitDistributed-element circuits are electrical circuits composed of lengths of transmission lines or other distributed components. These circuits perform the same functions as conventional circuits composed of passive components, such as capacitors, inductors, and transformers. They are used mostly at microwave frequencies, where conventional components are difficult (or impossible) to implement. Conventional circuits consist of individual components manufactured separately then connected together with a conducting medium.
Cavity magnetronThe cavity magnetron is a high-power vacuum tube used in early radar systems and currently in microwave ovens and in linear particle accelerators. A cavity magnetron generates microwaves using the interaction of a stream of electrons with a magnetic field, while moving past a series of cavity resonators, which are small, open cavities in a metal block. Electrons pass by the cavities and cause microwaves to oscillate within, similar to the functioning of a whistle producing a tone when excited by an air stream blown past its opening.
MicrowaveMicrowave is a form of electromagnetic radiation with wavelengths ranging from about 30 centimeters to one millimeter corresponding to frequencies between 1000 MHz and 300 GHz respectively. Different sources define different frequency ranges as microwaves; the above broad definition includes UHF, SHF and EHF (millimeter wave) bands. A more common definition in radio-frequency engineering is the range between 1 and 100 GHz (wavelengths between 0.3 m and 3 mm). In all cases, microwaves include the entire SHF band (3 to 30 GHz, or 10 to 1 cm) at minimum.
