Publication

Direct fabrication of NIL stamps using Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Oscar Vazquez Mena, Thomas Kiefer
2008
Posters

Abstract

Stencil Lithography has been used for the rapid and low cost fabrication of high resolution NIL stamps. The stamps are fabricated by Al deposition through a nanoscale shadow mask and subsequent Si etching. Features down to 50 nm in the stamps have been achieved. The functionality of the stamps has been tested by fabricating Al nanowires down to 100 nm wide.

Official source

https://infoscience.epfl.ch/entities/publication/441dd7b6-f885-4e77-89dc-818a4d74766c

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Direct fabrication of NIL stamps using Stencil Lithography

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