Publication

Complex image method for RF antenna-plasma inductive coupling calculation in planar geometry. Part II: measurements on a resonant network

Ivo Furno, Alan Howling, Philippe Frédérique Bruno Guittienne, Rémy Jacquier
2015
Journal Articles

Abstract

Measurements and analysis of a radio-frequency planar antenna are presented for applications in inductively-coupled plasma processing. The network of inductive and capacitive elements exhibits high currents under resonance which are efficient for plasma generation. Mode frequencies and impedances are accurately calculated by accounting for the mutual partial inductances using the impedance matrix. The effect of plasma inductive coupling on mode frequency shift and mode impedance is estimated using the complex image method, giving good agreement with experiment. It is proposed that the complex image method combined with the partial inductance concept (see the accompanying paper, Part I (Howling et al 2015 Plasma Sources Sci. Technol. 24 065014)) offers a general way to calculate the impedance characteristics of inductively-coupled plasma sources in planar geometry.

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https://infoscience.epfl.ch/entities/publication/3dcd3a1e-ff95-4f3a-a65b-a820b16c48c0

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Ivo Furno, Alan Howling, Philippe Frédérique Bruno Guittienne, Rémy Jacquier
2015
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/3dcd3a1e-ff95-4f3a-a65b-a820b16c48c0

About this result

Related concepts (32)

Electrical impedance

In electrical engineering, impedance is the opposition to alternating current presented by the combined effect of resistance and reactance in a circuit. Quantitatively, the impedance of a two-terminal circuit element is the ratio of the complex representation of the sinusoidal voltage between its terminals, to the complex representation of the current flowing through it. In general, it depends upon the frequency of the sinusoidal voltage.

Inductively coupled plasma atomic emission spectroscopy

Inductively coupled plasma atomic emission spectroscopy (ICP-AES), also referred to as inductively coupled plasma optical emission spectroscopy (ICP-OES), is an analytical technique used for the detection of chemical elements. It is a type of emission spectroscopy that uses the inductively coupled plasma to produce excited atoms and ions that emit electromagnetic radiation at wavelengths characteristic of a particular element. The plasma is a high temperature source of ionised source gas (often argon).

Inductance

Inductance is the tendency of an electrical conductor to oppose a change in the electric current flowing through it. The flow of electric current creates a magnetic field around the conductor. The field strength depends on the magnitude of the current, and follows any changes in current. From Faraday's law of induction, any change in magnetic field through a circuit induces an electromotive force (EMF) (voltage) in the conductors, a process known as electromagnetic induction.

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Complex image method for RF antenna-plasma inductive coupling calculation in planar geometry. Part II: measurements on a resonant network

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