Publication

Foundry compatible, efficient wafer-scale manufacturing of ultra-low loss, high-density Si<inf>3</inf>N<inf>4</inf> photonic integrated circuits

Tobias Kippenberg, Johann Emmeram Riemensberger, Rui Ning Wang, Xinru Ji, Zheru Qiu
2024

Abstract

We demonstrate ultra-low propagation loss, lithographic precision, and wafer-scale manufacturing for high-density Si3N4 photonic integrated circuits using an efficient DUV-based subtractive approach. We show a propagation loss as low as 1.4 dB/m at 1.55 µm.

Official source

https://infoscience.epfl.ch/entities/publication/33ca634e-f423-4dde-8e98-665c0074a0d9

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Foundry compatible, efficient wafer-scale manufacturing of ultra-low loss, high-density Si<inf>3</inf>N<inf>4</inf> photonic integrated circuits

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