Mediaspace scheduled maintenance: Aug 25, 2026 07:00 - 12:00 AM. During this time, videos will be temporarily unavailable. Check status updates.

Publication

Foundry compatible, efficient wafer-scale manufacturing of ultra-low loss, high-density Si<inf>3</inf>N<inf>4</inf> photonic integrated circuits

Tobias Kippenberg, Rui Ning Wang, Johann Emmeram Riemensberger, Zheru Qiu, Xinru Ji
2024
Conference Papers

Abstract

We demonstrate ultra-low propagation loss, lithographic precision, and wafer-scale manufacturing for high-density Si3N4 photonic integrated circuits using an efficient DUV-based subtractive approach. We show a propagation loss as low as 1.4 dB/m at 1.55 µm.

Official source

https://infoscience.epfl.ch/entities/publication/33ca634e-f423-4dde-8e98-665c0074a0d9

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Foundry compatible, efficient wafer-scale manufacturing of ultra-low loss, high-density Si<inf>3</inf>N<inf>4</inf> photonic integrated circuits

Graph Chatbot

Low-noise, frequency-agile photonic integrated lasers

Guided Nonlinear Optics for Information Processing

Spatial quantum-interference landscapes of multi-site-controlled quantum dots coupled to extended photonic cavity modes