Publication

STAMP FABRICATION FOR NANOIMPRINT LITHOGRAPHY BY PATTERN DEFINITION WITH STENCIL LITHOGRAPHY

2006
Reports

Abstract

A silicon stamp for nanoimprint lithography (NIL) was fabricated from the patterns defined by stencil lithography. Since stencil lithography has a capability of producing sub-micron patterns in a single process, we were able to make a silicon stamp with a very simple procedure consisting of only 4 steps. A series of experiments showed that about 200 nm of “defect” structures were well transferred from the stencil to the pattern on silicon stamp for NIL process, which replicates the structures into a silicon substrate by NIL followed by dry etching processes. The presented procedure has a potential to be applied to nanoscale stamp fabrication process.

Official source

https://infoscience.epfl.ch/entities/publication/19b5b6d8-fdcb-4dfd-a080-903245abd3de

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2006
Reports

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/19b5b6d8-fdcb-4dfd-a080-903245abd3de

About this result

Related concepts (32)

Nanoimprint lithography

Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

Photolithography

In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.

Nanolithography

Nanolithography (NL) is a growing field of techniques within nanotechnology dealing with the engineering (patterning e.g. etching, depositing, writing, printing etc) of nanometer-scale structures on various materials. The modern term reflects on a design of structures built in range of 10−9 to 10−6 meters, i.e. nanometer scale. Essentially, the field is a derivative of lithography, only covering very small structures. All NL methods can be categorized into four groups: photo lithography, scanning lithography, soft lithography and other miscellaneous techniques.

Related publications (1)

STAMP FABRICATION FOR NANOIMPRINT LITHOGRAPHY BY PATTERN DEFINITION WITH STENCIL LITHOGRAPHY

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