Krishnaparvathy Puthankovilakam

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Photolithography is one of the earliest technologies used to transfer patterns to a substrate. It is also known as optical lithography since it uses light to transfer the pattern. The main exposure techniques exist in the industry are projection printing, ...

Microstructures can be used to realize repetitive and singular high contrast features at different distances behind a structure. For practical applications, the amplitude field needs to be considered. To realize defined amplitude features at long distances ...

Printing industry and printing techniques are increasing its market value by new methodologies. The resolution and accuracy of the pattern transfer is always a challenge for the industry, especially for the proximity printing industries which use mask alig ...

The Babinet’s principle is a general theorem that holds for electromagnetic waves and is often applied to diffraction of light. Diffraction pattern of a body and that of the complement body are compared and the sum of both radiation patterns must be the sa ...

Proximity exposure techniques in lithography are getting more and more popular because of the cost of ownership advantage of mask aligners compared to projection systems. In this paper a gap between simulation and the final result, the prints will be close ...

Shaping of light fields behind amplitude and phase masks the basis the lithographic structure reproduction. The aerial image or better the intensity distribution defines the resolution of the structure to be printed. Contrast is the main parameter and to a ...

We try to find out the details of how light fields behind the structures of photomasks develop in order to determine the best conditions and designs for proximity printing. The parameters that we use approach real situations like structure printing at prox ...

Krishnaparvathy Puthankovilakam

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Limitations of Proximity Lithography Printing : Simulations, Experiments, and Applications

Structured amplitude and phase fields behind microstructures: The quest for high contrast modulation at proximity

Unified rule based correction for corners in proximity lithography mask using high resolution features

Light fields behind microstructures: study of the Babinet-principle in the Fresnel regime

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

Lightfields behind amplitude masks: Creating phase discontinuities

Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy