In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is opti ...
We report an experimental and theoretical study on the alignment error tolerance of a 2 µm-size solid immersion lens (SIL) illuminated by different types of focused spots. Tightly confined focal spots are of great interest for improving the performance of ...
We report on the generation of photonic nanojets, which resemble optical bottle beams. They are realized by manipulating the illumination of dielectric microspheres. As illumination we use the outer region of deliberately truncated Bessel-Gauss beam or a f ...
Spie-Int Soc Optical Engineering, Po Box 10, Bellingham, Wa 98227-0010 Usa2012
