Luis Guillermo Villanueva Torrijo

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Related publications (132)

Resistless ion implantation of sub-micron scale features through nano-stencil

Philippe Langlet, Jürgen Brugger, Oscar Vazquez Mena, Luis Guillermo Villanueva Torrijo

Resistless ion implantation of sub-micron scale features through nano-stencil ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Kristopher Pataky, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...

Elsevier2008

Stress and aging minimization in photoplastic AFM probes

Jürgen Brugger, Luis Guillermo Villanueva Torrijo

Photostructurable epoxy based resists, like SU-8, are soft materials with a Young's Modulus around 4 GPa, which makes them particularly suitable as base material to fabricate Atomic Force Microscopy (AFM) probes for non-destructive analysis of fragile samp ...

2008

Resistivity Measurements of Gold Wires Fabricated by Stencil Lithography on Flexible Polymer Substrates

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

We report on the patterning and characterization of titanium–gold (Ti–Au) wire test structures on polyethylene naphthalate (PEN), polyethylene terephthalate (PET) and polyimide (PI) substrates. PEN, PET and PI are flexible polymers which can withstand stre ...

Elsevier2008

Sub-100 nm-scale Aluminum Nanowires by Stencil Lithography: Fabrication and Characterization

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

We present the fabrication process and electrical characterization of sub-100 nm scale Al nanowires (NWs) fabricated by stencil lithography (SL). We use a stencil with sub- 100 nm wide nanoslits patterned by focused ion beam (FIB) milling. The stencil is a ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Elsevier2008

A single nanotrench in a palladium microwire for hydrogen detection

Jürgen Brugger, Oscar Vazquez Mena, Thomas Kiefer, Luis Guillermo Villanueva Torrijo

The hydrogen sensing characteristics of a single nanotrench fabricated by focused ion beam milling (FIB) in an evaporated palladium microwire are presented. In situ atomic force microscopy (AFM) measurements proved that, in the presence of H2, the trench c ...

2008

Design and optimization of nanogap array sensors

Jürgen Brugger, Thomas Kiefer, Luis Guillermo Villanueva Torrijo

We present a percolation based model which is suitable for the design of sensors based on highly ordered nanogap arrays. Monte-Carlo simulations and analytical expressions are used to calculate the sensitivity and dynamic range as a function of the topolog ...

2008

Metallic Nanowires by Full Wafer Stencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resist ...

American Chemical Society (ACS)2008

Stencil Lithography: Quick and Clean

Jürgen Brugger, Luis Guillermo Villanueva Torrijo

2008

Quick & Clean: Advances in High Resolution Stencil Lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Luis Guillermo Villanueva Torrijo

2007

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