Publications by Yury Kuzminykh

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Thin films of oxide materials are widely used for various types of applications. The selection of an appropriate deposition method depends on the aimed material and application. We review here a high vacuum chemical vapour deposition (HV-CVD) method, which ...

Chemical vapour deposition (CVD) processes depend on the availability of suitable precursors. Precursors that deliver a stable vapour pressure are favourable in classical CVD processes, as they ensure process reproducibility. In high vacuum CVD (HV-CVD) pr ...

Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and de ...

In atomic layer deposition processes (ALD), surface reactions of adsorbed precursor species lead to the formation of thin films. In order to achieve a well-controlled, self-limiting process, the substrate is sequentially exposed to different precursor mole ...

Combinatorial high vacuum chemical vapor deposition (HV-CVD) of mixed HfO2-Nb2O5 thin films has been demonstrated to yield amorphous layers at substrate temperatures where individually deposited pure HfO2 and Nb2O5 films are polycrystalline. Spectroscopic ...

We report on a heterodyne interferometric scanning near-field optical microscope developed for characterizing, at the nanometric scale, refractive index variations in thin films. An optical lateral resolution of 80 nm (lambda/19) and a precision smaller th ...

Yury Kuzminykh

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High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection

Evaluation of niobium dimethylamino-ethoxide for chemical vapour deposition of niobium oxide thin films

Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition

Combinatorial Discovery and Optimization of Amorphous HfO2-Nb2O5 Mixture with Improved Transparency

Determination of local refractive index variations in thin films by heterodyne interferometric scanning near-field optical microscopy

Optimization of Ca Precursor Transport for High Vacuum Chemical Vapor Deposition (HV-CVD)