Alan Howling

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Related publications (70)

Optimization of the microcrystalline silicon deposition efficiency

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Benjamin Strahm

Cost reduction constraints for microcrystalline silicon thin film photovoltaic solar cells require high deposition rates and high silane gas utilization efficiencies. If the requirements in deposition rate have sometimes been fulfilled, it is generally not ...

2007

Plasma diagnostics as a tool for process optimization

Christoph Hollenstein, Alan Howling, Benjamin Strahm

2007

Electromagnetic field nonuniformities in large area, high-frequency capacitive plasma reactors, including electrode asymmetry effects

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling

Electromagnetic wave propagation effects can give rise to important limitations for processing uniformity in large area, radio-frequency (rf) capacitive plasma reactors. The electromagnetic wavefield solution is derived for a capacitive, high-frequency, cy ...

2006

Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Hannes Schmidt

The electromagnetic standing wave effect can become the main source of nonuniformity limiting the use of very high frequency in large area reactors exceeding 1 m(2) required for industrial applications. Recently, it has been proposed and shown experimental ...

2006

Fast growth of microcrystalline silicon solar cells on LP-CVD ZnO in industrial KAI PECVD reactors

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Benjamin Strahm, Cédric Bucher

2006

Application of the shaped electrode technique to a large area rectangular capacitively-coupled plasma reactor to suppress standing wave nonuniformity

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Hannes Schmidt

2005

Comment on "Ion energy uniformity in high-frequency capacitive discharges" [Appl. Phys. Lett. 86, 021501 (2005)]

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Hannes Schmidt

2005

Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: the telegraph effect

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Lukas Derendinger, Hannes Schmidt

In large-area radio-frequency (rf) capacitive reactors, the redistribution of rf current to maintain current continuity near asymmetric sidewalls causes a perturbation in rf plasma potential to propagate along the resistive plasma between capacitive sheath ...

2005

Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactors

Laurent Fabien Hubert Sansonnens, Christoph Hollenstein, Alan Howling, Lukas Derendinger, Benjamin Strahm

In large area reactors, a local asymmetry of the electrode area, due to lateral grounded walls, causes a perturbation in rf plasma potential, due to the redistribution of lateral rf current, which propagates along the resistive plasma between capacitive sh ...

2005

High Efficiency p-i-n a-Si:H Solar Cells with Low Boron Cross-Contamination Prepared in a Large Area Single-Chamber PECVD Reactor

Stefano Benagli, Christoph Hollenstein, Alan Howling, Arvind Shah, Juliette Ballutaud, Cédric Bucher

In this work, a new type of short water vapor treatment of the interface between the p- and i-layer is presented. This novel treatment is performed under vacuum below 1 mbar for 5 min and considerably reduces the i-layer boron contamination in amorphous si ...

2004

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