Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H-2 discharges

In this work, the microstructure transition from amorphous to microcrystalline silicon is defined in terms of the silane concentration in the plasma as opposed to the silane concentration in the input gas flow. In situ Fourier transform infrared absorption spectroscopy combined with ex situ Raman spectroscopy has been used to calibrate and validate this approach. Results show that a relevant parameter to obtain mu c-Si : H from SiH4/H-2 mixtures is the plasma composition, which is determined not only by the gas dilution ratio but also by the silane depletion fraction. It is also shown that mu c-Si : H can only be deposited efficiently, in terms of gas utilization, at a high rate by using high input concentration and depletion of silane.