Explores the impact of strain on semiconductor band structures, epitaxy, critical thickness, and defect formation, emphasizing the role of Hooke's law and elasticity theory.
Covers the fundamentals and techniques of Chemical Vapor Deposition (CVD), including mass transfer, film growth rate calculation, and various CVD techniques.
Explores various Chemical Vapor Deposition processes, including APCVD, SACVD, LPCVD, UHV/CVD, PECVD, and MOCVD, focusing on film growth and plasma effects.