Mediaspace scheduled maintenance: Aug 25, 2026 07:00 - 12:00 AM. During this time, videos will be temporarily unavailable. Check status updates.

Lecture

Fabrication extended: Deposition

Description

This lecture covers the process of deposition, which involves growing a thin film of material onto a substrate using various techniques. It explains thermal oxidation for growing SiO2 on Si substrates, emphasizing the key parameters like temperature and time. The lecture also delves into chemical vapor deposition (CVD), detailing how material is deposited on a substrate through chemical reactions between gases or reagents and the surface. Different types of CVD techniques are discussed, including PECVD, which is a modern method suitable for substrates that cannot withstand high temperatures.

This video is available exclusively on Mediaspace for a restricted audience. Please log in to MediaSpace to access it if you have the necessary permissions.

Watch on Mediaspace

Official source

Ontological neighbourhood

Chemical engineering

Materials science: Thin film

Related concepts (12)

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Vacuum deposition

Vacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.

Physical vapor deposition

Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

Plasma-enhanced chemical vapor deposition

Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by radio frequency (RF) (alternating current (AC)) frequency or direct current (DC) discharge between two electrodes, the space between which is filled with the reacting gases.

Evaporation (deposition)

Evaporation is a common method of thin-film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel directly to the target object (substrate), where they condense back to a solid state. Evaporation is used in microfabrication, and to make macro-scale products such as metallized plastic film. Evaporation involves two basic processes: a hot source material evaporates and condenses on the substrate. It resembles the familiar process by which liquid water appears on the lid of a boiling pot.

Related lectures (32)

Thin-Film Processing

Explores thin-film processing techniques, including CVD, ALD, and plasma interactions, emphasizing their advantages and applications.

PVD 7: Other Techniques MOOC: Micro and Nanofabrication (MEMS)

Explores ion plating, MBE, and PLD techniques in thin film fabrication.

Thin Film Growth: Mechanisms and Applications

Explores thin film growth mechanisms, organic thin film considerations, deposition techniques, and patterning for electronic devices.

Thin-Film Processing: Deposition Techniques

Explores thin-film processing techniques, focusing on chemical vapor deposition advantages, growth modes, ALD, plasma role, and discharge initiation.

Thin-Film Processing: Plasma Deposition