Covers X-Ray Photoelectron Spectrometry (XPS), a surface analysis technique developed by Kai Siegbahn, explaining its components, mechanism, and analysis methods.
Explores surface analysis methods using electrons, ions, atoms, and photons, emphasizing the importance of ToF-SIMS for in-depth surface analysis in various fields.
Covers the principles of photoemissive detectors and the photoelectric effect, detailing electron behavior in metals and semiconductors under different light conditions.