Lecture

Projection Imaging and Physics of Materials

Graph Chat

Chat with Graph Search

Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.

DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.

In course

MICRO-520: Laser microprocessing

The physical principles of laser light materials interactions are introduced with a large number of industrial application examples. Materials processing lasers are developing further and further, the lecture presents the physical limitations of the proces ...

Description

This lecture covers topics such as mask projection systems, laser micro-processing, mask materials for lithography, dielectric masks, submicron structures, interference-based methods, Gaussian beam properties, waveguiding principles, laser light-materials interaction, Maxwell's equations, wave propagation, photon energy units, refractive index, polarisation density, resonances and relaxations, electronic polarisability, and light properties.

Instructor

Patrik Willi Hoffmann

Expertise WettabilityMico-structuringElectron-beam DepositionPhotodepositionPhotoablationNano-optics Mission Patrik Hoffmann is heading the laboratory for Advanced Materials Processing at Empa. Laser materials processing including Additive Manufacturing are key topics in recent years.At the EPFL cite in the Laboratory for Optical Materials and Characterization LPMAT, novel functional material depositions by HV-CVD are studied. Recently BaTiO3 heteroepitaxial films have been grown on SrTiO3 buffered silicon

Official source

Related concepts (32)

Photolithography

In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.

Laser

A laser is a device that emits light through a process of optical amplification based on the stimulated emission of electromagnetic radiation. The word laser is an anacronym that originated as an acronym for light amplification by stimulated emission of radiation. The first laser was built in 1960 by Theodore Maiman at Hughes Research Laboratories, based on theoretical work by Charles H. Townes and Arthur Leonard Schawlow. A laser differs from other sources of light in that it emits light that is coherent.

Photomask

A photomask is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon). Several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. For IC production in the 1960s and early 1970s, an opaque rubylith film laminated onto a transparent mylar sheet was used.

Radio propagation

Radio propagation is the behavior of radio waves as they travel, or are propagated, from one point to another in vacuum, or into various parts of the atmosphere. As a form of electromagnetic radiation, like light waves, radio waves are affected by the phenomena of reflection, refraction, diffraction, absorption, polarization, and scattering. Understanding the effects of varying conditions on radio propagation has many practical applications, from choosing frequencies for amateur radio communications, international shortwave broadcasters, to designing reliable mobile telephone systems, to radio navigation, to operation of radar systems.

Interference lithography

Interference lithography (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. The basic principle is the same as in interferometry or holography. An interference pattern between two or more coherent light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima.

Related lectures (61)

E-M Wave Propagation in Materials: Loss-less vs. Lossy

Explores electromagnetic wave propagation in materials, including loss-less and lossy mediums, optical constants, and dispersion in glasses.

Electromagnetic Waves and Laser Amplification

Explores laser light amplification, Maxwell's equations, electromagnetic waves, electron oscillation, absorption coefficients, and refractive indices.

Telegrapher's Equations: Solutions and Examples

Explores time-domain solutions for lossless lines and examples of wave propagation behavior.

Multiconductor Transmission Lines

Explores solutions and examples for multiconductor transmission lines, covering line parameters, wave propagation, inductance, capacitance matrices, and modal wave equations.

Transmission Lines Theory: Maxwell Equations and Wave Connection