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MICRO-621: MOOC: Micro and Nanofabrication (MEMS)

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Lectures in this course (64)

Lithography: General Concepts and Mask Fabrication MOOC: Micro and Nanofabrication (MEMS)

Covers lithography concepts, mask fabrication, UV lithography, and emerging techniques.

Electron Beam Lithography: Tool Overview MOOC: Micro and Nanofabrication (MEMS)

Explores electron beam lithography, covering electron gun brightness, lens aberrations, beam diameter, and tool implementation.

Design Preparation and Fracture: Electron Beam Lithography MOOC: Micro and Nanofabrication (MEMS)

Explores design preparation, fracture, and electron beam lithography processes in nanofabrication.

Thermo-mechanical Micro-actuator: Case Study MOOC: Micro and Nanofabrication (MEMS)

Explores the design and fabrication of a bi-morph micro-actuator and its thermo-mechanical characterization through DC and AC current applications.

Electron Beam Lithography: Interactions and Resist Contrast MOOC: Micro and Nanofabrication (MEMS)

Explores electron-sample interactions and resist contrast in lithography for high-resolution fabrication.

Lithography: Electron Beam Lithography and Resists MOOC: Micro and Nanofabrication (MEMS)

Explores electron beam lithography using PMMA and HSQ resists, multi-layer processes, and alignment techniques.

Electron Beam Lithography: Proximity Effect Corrections MOOC: Micro and Nanofabrication (MEMS)

Explores proximity effect corrections in electron beam lithography for small and large features, emphasizing the importance of beam point spread function modeling.

Lithography: Scanning Probe Lithography MOOC: Micro and Nanofabrication (MEMS)

Delves into scanning probe lithography, exploring its principles and potential applications in nano-fabrication.

Lithography: Alternative Patterning Methods MOOC: Micro and Nanofabrication (MEMS)

Explores alternative lithography methods like nanoimprint and stencil lithography for nanowire fabrication and exotic surface patterning.

Lithography: Resist Properties and Exposure Methods MOOC: Micro and Nanofabrication (MEMS)

Covers lithography concepts, resist properties, exposure methods, and pattern transfer techniques.

Lithography: Photoresist Sensitivity and Modulation Transfer Function MOOC: Micro and Nanofabrication (MEMS)

Discusses photoresist properties in lithography resolution and the role of the optical transfer function.

Lithography: Mask and Laser Writing MOOC: Micro and Nanofabrication (MEMS)

Explores photomask creation, exposure methods, direct laser writing, resolution, and resist development in MEMS applications.

Clip Mask Fabrication MOOC: Micro and Nanofabrication (MEMS)

Showcases the practical steps of fabricating a mask for UV lithography.

Lithography: Tools and Techniques MOOC: Micro and Nanofabrication (MEMS)

Covers the principles and tools used in lithography for micro and nanofabrication.

Cleanroom Basics: Introduction to Contamination Issues MOOC: Micro and Nanofabrication (MEMS)

Explores cleanroom basics and contamination issues in microfabrication processes, emphasizing the impact of contaminants on device performance and reliability.

Clip Mask Aligner Lithography MOOC: Micro and Nanofabrication (MEMS)

Covers UV lithography using a clip mask aligner for micro and nanofabrication.

Electron Beam Lithography: Tool Overview MOOC: Micro and Nanofabrication (MEMS)

Explores Electron Beam Lithography (EBL), its tool overview, vacuum levels, electron sources, and guns for sub-20 nm feature fabrication.

Electron Beam Lithography: II Electron Optics and Beam Deflection MOOC: Micro and Nanofabrication (MEMS)

Covers electron beam control, focusing, lens types, and writing strategies.

Dry etching: fundamentals and applications MOOC: Micro and Nanofabrication (MEMS)

Explores the fundamentals of dry etching in a gas plasma and provides simple rules for choosing dry etchants.

Dry Etching: Techniques and Equipment MOOC: Micro and Nanofabrication (MEMS)

Explores various dry etching techniques for silicon and the equipment used in the process, including RF plasma sources and HF vapor phase etchers.

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