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Related publications (30)

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Electroluminescence of Single InGaN/GaN Micropyramids

Hua Zhang, Gwénolé Jean Jacopin

The results of the fabrication of technological regimes of formation and the study of the optical properties of light emitting diodes (LED) micropyramids based on InGaN/GaN are presented. The structures were formed by the method of Metalorganic vapour-phas ...

PLEIADES PUBLISHING INC2019

Spatial coherence properties of an LED-based illumination system for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Wilfried Noell, Raoul Kirner, Johana Bernasconi

A high-power LED-based illumination system has been developed as a replacement for the mercury arc lamps used in mask-aligner lithography. LEDs are arranged in a grid array and placed in the entrance aperture of individual reflectors. Those reflectors decr ...

SPIE2019

Inkjet printing and electrocatalysis

Victor Costa Bassetto

The transition in energy matrix, from fossil to renewable energy sources, will require the utilization of grid levelling alternatives to cope with the intermittent characteristic of renewable energy. Advanced electrochemical energy conversion and storage d ...

EPFL2019

Multi-Scale Electrolyte Transport Simulations for Lithium Ion Batteries

Max David Veit

Establishing a link between atomistic processes and battery cell behavior is a major challenge for lithium ion batteries. Focusing on liquid electrolytes, we describe parameter-free molecular dynamics predictions of their mass and charge transport properti ...

2019

High power modular LED-based illumination system for lithography applications

Hans Peter Herzig, Toralf Scharf, Wilfried Noell, Raoul Kirner, Johana Bernasconi

Mask-aligner lithography is a technology used to transfer patterns with critical dimensions in the micrometer range from below 1 micron for contact printing to a dozen of microns in proximity printing. This technology is widely used in the fabrication of M ...

2018

High power ultraviolet LED illumination systems: coherence properties and applications in photolithography

Johana Bernasconi

Mask-aligner photolithography is a technology used to replicate patterns from a mask to a photosensitive substrate. It is widely used in the fabrication of MEMS and micro-optical components, and for other applications with dimensions in the micrometer rang ...

EPFL2018

High-power modular LED-based illumination systems for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

Mask-aligner lithography is traditionally performed using mercury arc lamps with wavelengths ranging from 250 nm to 600 nm with intensity peaks at the i, g and h lines. Since mercury arc lamps present several disadvantages, it is of interest to replace the ...

2018

Kariba plunge pool rehabilitation

Anton Schleiss, Giovanni De Cesare, Azin Amini, Ivan Stojnic, Claudia Ylla Arbos

The Kariba Dam is a 128 m high arch dam located on the Zambezi River, between Zambia and Zimbabwe. It forms the Kariba lake, with a surface of 5400 km2 and a capacity of 185 km3. In the 20 years following dam construction, heavy rainfalls required frequent ...

2018

Design of a Throttled Surge Tank for Refurbishment by Increase of Installed Capacity at a High-Head Power Plant

Anton Schleiss, Giovanni De Cesare, Nicolas Jean François Pascal Ghislain Adam

The Swiss confederation aims to phase out nuclear power production with its Energy Strategy 2050 program by increasing the renewable energy contribution to its overall energy generation. Hydroelectricity, which is the most important form of renewable energ ...

American Society of Civil Engineers2018

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Toralf Scharf, Wilfried Noell, Raoul Kirner

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

2018