Publications associées à Magnetotransport properties of Topological Insulator thin films

Publications associées (5)

Transparent Porous Conductive Substrates for Gas-Phase Photoelectrochemical Hydrogen Production

Kevin Sivula, Jun Ho Yum, Simon Nussbaum, Rebekah Anne Wells, Marina Caroline Michèle Caretti, Hannah Elizabeth Johnson, Emeline Cécile Rideau, Benjamin Goldman, Elizaveta Potapova Mensi

Gas diffusion electrodes are essential components of common fuel and electrolysis cells but are typically made from graphitic carbon or metallic materials, which do not allow light transmittance and thus limit the development of gas-phase based photoelectr ...

Wiley-V C H Verlag Gmbh2023

Experiments and modelling for glow discharge plasmas applied to niobium sputter deposition in superconducting radiofrequency cavities

Thibaut François Hugo Richard

Thin film coatings are ubiquitous in modern daily lives, from the semi-conductor industry to aesthetic applications, and rely on the modification of a given material to enhance its surface properties. At CERN (European Organization for Nuclear Research), t ...

EPFL2019

New spiral beam screen design for the FCC-hh injection kicker magnet

Agnieszka Chmielinska

The injection kicker system for the Future Circular Collider (FCC-hh) must satisfy demanding requirements. To achieve low pulse ripple and fast field rise and fall times, the injection system will use ferrite loaded transmission line type magnets. The beam ...

IOP PUBLISHING LTD2019

In situ Studies of Peptide and Protein Assemblies at the Solid-Liquid Interface : Hierarchical Self-Assembly, Dynamics and Functional Properties

Bart Willem Stel

At the interface between science and engineering, there is the field of biomimicry: Innovations inspired by the observation of natural, evolutionary optimized biological structures and processes. To understand the challenges of biomimicry, the concept of â ...

EPFL2018

Effect of deposition angle on the structure and properties of pulsed-DC magnetron sputtered TiAlN thin films

Alireza Karimi, Marco Cantoni, Akshath Raghu Shetty

This article reports the comparison of structure and properties of titanium aluminum nitride (TiAlN) films deposited onto Si(100) substrates under normal and oblique angle depositions using pulsed-DC magnetron sputtering. The substrate temperature was set ...

2011