Duv photolithography electrode fabrication method and electrode produced using the method

DUV photolithography compatible electrode fabrication method comprising providing at least one material surface to which at least one electrode is to be attached; providing at least one undercut non-photoresist material or support between the at least one material surface and a photoresist material or layer provided on the at least one undercut non-photoresist material or support; providing or depositing at least one electrode or lift-off material on the photoresist material or layer and on the at least one material surface to form at least a portion of the electrode; and removing or stripping the photoresist material or layer from the at least one undercut non-photoresist material or support to remove the at least one electrode or lift-off material from the at least one undercut non-photoresist material or support.