Selective deposition of gold nanoparticles using Van der Waals interactions

Gold nanoparticles with hydrophobic surface have been deposited on a silicon substrate chemically patterned by reactive ion etching through a stencil mask and chemical vapour deposition of alkyl silanes. After deposition by dipping and adequate rinsing, the density of nanoparticles was found twice higher on the chemical patterns due to a difference of solvent affinity between patterned and bare silica.