Antagonistic Dual-Wavelength Tomographic Volumetric Additive Manufacturing

Tomographic volumetric additive manufacturing (TVAM) forms 3D objects by accumulating dose from angular light projections, but the same projections that cure the target also deposit background dose in the surrounding resin. Background irradiation is therefore an unavoidable limitation of TVAM; antagonistic dual-wavelength TVAM addresses it by incorporating wavelength-controlled radical generation and radical quenching into the reconstruction algorithm. A 405 nm channel activates Ivocerin to generate radicals, while a 365 nm channel cleaves onitrobenzyl–TEMPO to release the radical quencher TEMPO. Programmable inhibition therefore becomes a second tomographic field which suppresses accumulated background response while retaining the target response, defines feature boundaries by activation–inhibition balance and can carry complete 3D shape information. Antagonistic TVAM therefore expands TVAM from optical reconstruction to the programming of chemical fields. Simulations further show that this chemical degree of freedom can expand the accessible material window, oppose diffusion-driven boundary broadening and suppress attenuation-induced overexposure.