Monitoring the energy of the metal ion-content plasma-assisted deposition and its implication for bacterial inactivation

Cu-polyester (Cu-PES) was sputtered by high power impulse magnetron sputtering (HIPIMS) and by low energy direct current magnetron sputtering (DCMS). The total amount and distribution of the Ar+, Cu+ and Cu2+ ions were determined as well as the bacterial inactivation kinetics mediated by DCMS and HIPIMS samples. The separation of extracellular and intracellular processes leading to bacterial inactivation was assessed on normal and genetically modified E. coli.