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This report summarises the activities conducted over the past three and a half months as part of a semester project titled 'Fabrication of suspended microchannel resonators' within the Advanced NEMS Laboratory, guided by Prof. Guillermo Villanueva and Yara Abdelaal. The focus was on the nano and micro fabrication of channels intended for subsequent deposition with silicon nitride. Two types of wafers were used in this project: one with a single layer of nitride and the other with both nitride and oxide layers. The project had two main objectives. The first was to determine the optimal parameters for the bosh process to achieve a smooth bottom surface for both types of wafers. Secondly, a dose test was conducted to determine the relationship between exposure energy and aperture diameter on a double-layered wafer for lithography exposure parameters. The detailed method and experimental setups are explained in detail. The results are presented in graphs and discussed in the end of the report.