Ptycho-LDM: A Hybrid Framework for Efficient Phase Retrieval of EUV Photomasks Using Conditional Latent Diffusion Models

Extreme ultraviolet (EUV) photomask inspection is a critical step in semiconductor manufacturing, requiring high-resolution, high-throughput solutions to detect nanometer-scale defects. Traditional actinic imaging systems relying on complex optics have a high cost of ownership and require frequent upgrades. An alternative is lensless imaging techniques based on ptychography, which offer high-fidelity reconstruction but suffer from slow throughput and high data demands. In particular, the ptychographic standard solver—the iterative Difference Map (DifMap) algorithm—requires many measurements and iterations to converge. We propose Ptycho-LDM, a hybrid framework integrating DifMap with a conditional Latent Diffusion Model for rapid and accurate phase retrieval. Ptycho-LDM alleviates high data acquisition demand by leveraging data-driven priors while offering improved computational efficiency. Our method performs coarse object retrieval using a resource-constrained reconstruction from DifMap and refines the result using a learned prior over photomask patterns. This prior enables high-fidelity reconstructions even in measurement-limited regimes where DifMap alone fails to converge. Experiments on actinic patterned mask inspection (APMI) show that Ptycho-LDM recovers fine structure and defect details with far fewer probe positions, surpassing the DifMap in accuracy and speed. Furthermore, evaluations on both noisy synthetic data and real APMI measurements confirm the robustness and effectiveness of Ptycho-LDM across practical scenarios. By combining generative modeling with physics-based constraints, Ptycho-LDM offers a promising scalable, high-throughput solution for next-generation photomask inspection.