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Concept

Gravure ionique réactive

Publications associées (25)

Variable-height microfluidic channels for accurate immobilization of C. elegans worms by using a single dry etching step

Martinus Adela Maria Gijs, Hüseyin Baris Atakan, Rongrong Xiang

We present an aspect ratio dependent etching (ARDE) method, utilizing the Bosch dry etching process of silicon, to create the optimal silicon master microstructures for replication of polydimethylsiloxane (PDMS) microchannels that allow immobilizing C. ele ...

2018

Monolithic Fabrication of Silicon Nanowires Bridging Thick Silicon Structures

Yusuf Leblebici, Davide Sacchetto, Oliver Peric, Zuhal Tasdemir

A monolithic process is developed for the fabrication of Si nanowires within thick Si substrates. A combination of anisotropic etch and sidewall passivation is utilized to protect and release Si lines during the subsequent deep etch. An etch depth of 10 mu ...

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC2018

III-Nitride Semiconductor Photonic Nanocavities on Silicon

Ian Michael Rousseau

Optical nanocavities enhance light-matter interaction due to their high quality factors (Q) and small modal volumes (V). The control of light-matter interaction lies at the heart of potential applications for integrated optical circuits, including optical ...

EPFL2018

Fabrication and Characterization of 1-D diffusing elements

Hans Peter Herzig, Toralf Scharf, Myun Sik Kim, Roland Andreas Bitterli

Certain high power laser applications require thin homogeneous laser lines. In this paper we describe the concept, fabrication and characterization of a 1-D diffuser that generates such a line. The device is based on an array of concave cylinder lenses wit ...

2009

Nanoscale Lithography and Thermometry with Thermal Scanning Probes

Samuel Tobias Howell

Thermal scanning probe lithography (t-SPL) is an advanced lithography technique in which a heated atomic force microscope tip locally modifies a sample material. Due to the nanometer-sized tip apex diameter, t-SPL enables patterning of sub-10 nm structures ...

EPFL2018