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Concept

Lithographie

Publications associées (22)

Microscale Liquid Metal Conductors for Stretchable and Transparent Electronics

Stéphanie Lacour, Giuseppe Schiavone, Ivan Furfaro, Laurent Mirko Dejace, Haotian Chen

Integrated wearable electronics capable of transducing and transmitting biophysical information on complex and dynamic systems are attracting high interest across the consumer electronics, clinical, and research domains. Gallium and gallium-based liquid me ...

Wiley2021

Template-assisted electrodeposition of nickel and nickel copper 3D microcomponents

Patrik Schürch

New types of metamaterials and architectured material require metallic materials with precise structural design in the microscale. However, additivemanufacturing of metallic structures in themicroscale has proven difficult, as the demand for the material q ...

EPFL2020

Fixed DNA Molecule Arrays for High-Throughput Single DNA-Protein Interaction Studies

Vytautas Navikas

The DNA Curtains assay is a recently developed experimental platform for protein-DNA interaction studies at the single-molecule level that is based on anchoring and alignment of DNA fragments. The DNA Curtains so far have been made by using chromium barrie ...

AMER CHEMICAL SOC2019

Scanning Probe-Directed Assembly and Rapid Chemical Writing Using Nanoscopic Flow of Phospholipids

Vytautas Navikas

Nanofluidic systems offer a huge potential for discovery of new molecular transport and chemical phenomena that can be employed for future technologies. Herein, we report on the transport behavior of surface-reactive compounds in a nanometer-scale flow of ...

AMER CHEMICAL SOC2019

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Toralf Scharf, Wilfried Noell, Raoul Kirner

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

2018

High power modular LED-based illumination system for lithography applications

Hans Peter Herzig, Toralf Scharf, Wilfried Noell, Raoul Kirner, Johana Bernasconi

Mask-aligner lithography is a technology used to transfer patterns with critical dimensions in the micrometer range from below 1 micron for contact printing to a dozen of microns in proximity printing. This technology is widely used in the fabrication of M ...

2018

Micro-mechanics of 3D architectured metals synthesized by electrodeposition

Maxime Alain Baptiste Mieszala

Cellular metallic materials have emerged as a new promising class of materials due to their lightweight porous structures and advanced multi-functional properties. Originally limited to random metallic foams, modern lithography techniques have enabled the ...

EPFL2018

Unified rule based correction for corners in proximity lithography mask using high resolution features

Hans Peter Herzig, Toralf Scharf, Krishnaparvathy Puthankovilakam

Printing industry and printing techniques are increasing its market value by new methodologies. The resolution and accuracy of the pattern transfer is always a challenge for the industry, especially for the proximity printing industries which use mask alig ...

Elsevier2017

Coherence management in lithography printing systems

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

In proximity lithography, interference and diffraction effects arise when printing small features because of the proximity gap. Different techniques are used in order to control and take advantage of theses effects. In this paper, the focus is set on the M ...

Spie-Int Soc Optical Engineering2016

Post-cmos processing and 3d integration based on dry-film lithography

Yusuf Leblebici, Carlotta Guiducci, Yüksel Temiz

A method for performing a post processing pattern on a diced chip having a foot-print, comprises the steps of providing a support wafer; applying a first dry film photoresist to the support wafer; positioning a mask corresponding to the footprint of the di ...

2015

PDMS-based, magnetically actuated variable optical attenuators obtained by soft lithography and inkjet printing technologies

Jürgen Brugger, Victor Javier Cadarso Busto

This paper reports and compares the implementation of magnetic variable optical attenuators (M-VOA) by two fabrication strategies. In the first case, a two-layer structure containing a non-doped polydimethylsiloxane (PDMS) layer on a magnetic PDMS (M-PDMS) ...

Elsevier2014

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

Hans Peter Herzig, Toralf Scharf, Qing Tan, David Nguyen, Krishnaparvathy Puthankovilakam

Proximity exposure techniques in lithography are getting more and more popular because of the cost of ownership advantage of mask aligners compared to projection systems. In this paper a gap between simulation and the final result, the prints will be close ...

Spie-Int Soc Optical Engineering2014

Application of stencil masks for ion beam lithographic patterning

Jürgen Brugger, Andreea Veronica Savu

The application of Au/Si3N4 stencil masks for the transfer of patterns using different MeV-ion beams with various substrates has been investigated. The techniques investigated were namely, conventional lithography with positive- and negative-tone resist po ...

Elsevier2013

Reusable plasmonic substrates fabricated by interference lithography: a platform for systematic sensing studies

Olivier Martin, Thomas Gerd Siegfried

Surface-enhanced Raman scattering (SERS) has become increasingly popular in the scientific and industrial communities because of its analytical capabilities and potential to study fundamentals in plasmonics. Although under certain conditions extremely high ...

Wiley-Blackwell2013

Organic Pentacene Thin Film Transistors on Flexible Substrates Fabricated by Stencil Lithography

Katrin Sidler Arnet

This thesis presents the fabrication and characterization of organic thin film transistors (TFTs) on flexible polymer substrates and the development of compliant stencil lithography to significantly improve the patterning resolution on full-wafer scale. Po ...

EPFL2010

Mechanically tuneable microoptical structure based on PDMS

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Victor Javier Cadarso Busto

A PDMS based tuneable microoptical system fabricated merging deep reactive ion etching, SU-8 and soft lithography, with a low-cost (mass-production), simple and highly repetitive technology, is presented. This system consists on a structure of two microlen ...

2009

Stencil assisted reactive ion etching for micro and nano patterning

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Stencil-assisted oxygen reactive ion etching is a low-cost and parallel process for the replication of micrometric and nanometric patterns in any organic material. This lithography process allows the patterning of organic material non sensitive to electron ...

2008

Method for deposition of a sensor on a conductive substrate

Gaetan Frederick Marti

The process comprises the step of deposition of a sensor and of a part or of the entirety of a treatment unit on a not necessarily planar conductive surface by a soft lithography technique. ...

2008

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Marc Antonius Friedrich van den Boogaart, Katrin Sidler Arnet, Kristopher Pataky

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Predicting mask distortion, clogging and pattern transfer for stencil lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

One of the ultimate tasks for stencil lithography is the ability to fabricate arrays of structures with controlled dimensions on the nanometer scale precisely positioned on a suitable surface. The race to shrink feature sizes requires the limits of convent ...

2007