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100 mm dynamic stencils pattern sub-micrometre structures

Related publications (27)

Design Methodologies and CAD for Emerging Nanotechnologies

With technology scaling reaching the fundamental limits of Si-CMOS in the near future, the semiconductor industry is in quest for innovation from various disciplines of integrated circuit (IC) design. At a fundamental level, technology forms the main drive ...

EPFL2013

On Micro Optical Elements for Efficient Light Diffusion

Roland Andreas Bitterli

Efficient light management is one of the key issues in modern energy conversion systems, be it to collect optical power or to redistribute light generated by high power light emitters. This thesis touches mainly on the subject of efficient light redistribu ...

EPFL2013

3D-Integration of a Carbon Nanotube based RF-NEMS

Rokhaya Gueye

In the framework of the NanoTera project CabTuRes, a system-in-package for a nano-resonator was proposed, integrating CMOS driving electronics and vacuum encapsulation. This doctoral research aimed to investigate 3D-integration technologies for a Single-Wa ...

EPFL2013

3D Integration Technology for Lab-on-a-Chip Applications

Yüksel Temiz

This study adds a new dimension to lab-on-a-chip systems by employing three-dimensional (3D) integration technology for improved performance, higher functionality, and on-chip computational power. Despite the extensive amount of current research on 3D memo ...

EPFL2012

In-plane illuminated metallic annular aperture array for sensing application

Hans Peter Herzig, Armando Cosentino, Qing Tan

We propose here an application to sensing of annular aperture arrays (AAA). We theoretically investigate the optical properties of the reflective AAA device when illuminated in-plane. The cavity presents almost perfect absorption due to the waveguide mode ...

Optical Society of America2012

Design Methods and Tools for Application-Specific Predictable Networks-on-Chip

Ciprian Seiculescu

As the complexity of applications grows with each new generation, so does the demand for computation power. To satisfy the computation demands at manageable power levels, we see a shift in the design paradigm from single processor systems to Multiprocessor ...

EPFL2012

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Oscar Vazquez Mena, Katrin Sidler Arnet, Andreea Veronica Savu, Shenqi Xie, Wei Tang

Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...

Microelectronic Engineering2011

Related publications (27)