Supercritical water reactorThe supercritical water reactor (SCWR) is a concept Generation IV reactor, designed as a light water reactor (LWR) that operates at supercritical pressure (i.e. greater than 22.1 MPa). The term critical in this context refers to the critical point of water, and must not be confused with the concept of criticality of the nuclear reactor. The water heated in the reactor core becomes a supercritical fluid above the critical temperature of 374 °C, transitioning from a fluid more resembling liquid water to a fluid more resembling saturated steam (which can be used in a steam turbine), without going through the distinct phase transition of boiling.
Amorphous siliconAmorphous silicon (a-Si) is the non-crystalline form of silicon used for solar cells and thin-film transistors in LCDs. Used as semiconductor material for a-Si solar cells, or thin-film silicon solar cells, it is deposited in thin films onto a variety of flexible substrates, such as glass, metal and plastic. Amorphous silicon cells generally feature low efficiency.
Polycrystalline siliconPolycrystalline silicon, or multicrystalline silicon, also called polysilicon, poly-Si, or mc-Si, is a high purity, polycrystalline form of silicon, used as a raw material by the solar photovoltaic and electronics industry. Polysilicon is produced from metallurgical grade silicon by a chemical purification process, called the Siemens process. This process involves distillation of volatile silicon compounds, and their decomposition into silicon at high temperatures. An emerging, alternative process of refinement uses a fluidized bed reactor.
CANDU reactorThe CANDU (Canada Deuterium Uranium) is a Canadian pressurized heavy-water reactor design used to generate electric power. The acronym refers to its deuterium oxide (heavy water) moderator and its use of (originally, natural) uranium fuel. CANDU reactors were first developed in the late 1950s and 1960s by a partnership between Atomic Energy of Canada Limited (AECL), the Hydro-Electric Power Commission of Ontario, Canadian General Electric, and other companies.
Pressurized water reactorA pressurized water reactor (PWR) is a type of light-water nuclear reactor. PWRs constitute the large majority of the world's nuclear power plants (with notable exceptions being the UK, Japan and Canada). In a PWR, the primary coolant (water) is pumped under high pressure to the reactor core where it is heated by the energy released by the fission of atoms. The heated, high pressure water then flows to a steam generator, where it transfers its thermal energy to lower pressure water of a secondary system where steam is generated.
Chemical vapor depositionChemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Pebble-bed reactorThe pebble-bed reactor (PBR) is a design for a graphite-moderated, gas-cooled nuclear reactor. It is a type of very-high-temperature reactor (VHTR), one of the six classes of nuclear reactors in the Generation IV initiative. The basic design of pebble-bed reactors features spherical fuel elements called pebbles. These tennis ball-sized pebbles (approx. in diameter) are made of pyrolytic graphite (which acts as the moderator), and they contain thousands of micro-fuel particles called tristructural-isotropic (TRISO) particles.
Reactor pressure vesselA reactor pressure vessel (RPV) in a nuclear power plant is the pressure vessel containing the nuclear reactor coolant, core shroud, and the reactor core. Russian Soviet era RBMK reactors have each fuel assembly enclosed in an individual 8 cm diameter pipe rather than having a pressure vessel. Whilst most power reactors do have a pressure vessel, they are generally classified by the type of coolant rather than by the configuration of the vessel used to contain the coolant.
Boiling water reactorA boiling water reactor (BWR) is a type of light water nuclear reactor used for the generation of electrical power. It is the second most common type of electricity-generating nuclear reactor after the pressurized water reactor (PWR), which is also a type of light water nuclear reactor. The main difference between a BWR and PWR is that in a BWR, the reactor core heats water, which turns to steam and then drives a steam turbine. In a PWR, the reactor core heats water, which does not boil.
Thin-film solar cellThin-film solar cells are made by depositing one or more thin layers (thin films or TFs) of photovoltaic material onto a substrate, such as glass, plastic or metal. Thin-film solar cells are typically a few nanometers (nm) to a few microns (μm) thick–much thinner than the wafers used in conventional crystalline silicon (c-Si) based solar cells, which can be up to 200 μm thick. Thin-film solar cells are commercially used in several technologies, including cadmium telluride (CdTe), copper indium gallium diselenide (CIGS), and amorphous thin-film silicon (a-Si, TF-Si).
Monocrystalline siliconMonocrystalline silicon, more often called single-crystal silicon, in short mono c-Si or mono-Si, is the base material for silicon-based discrete components and integrated circuits used in virtually all modern electronic equipment. Mono-Si also serves as a photovoltaic, light-absorbing material in the manufacture of solar cells. It consists of silicon in which the crystal lattice of the entire solid is continuous, unbroken to its edges, and free of any grain boundaries (i.e. a single crystal).
Crystalline siliconCrystalline silicon or (c-Si) Is the crystalline forms of silicon, either polycrystalline silicon (poly-Si, consisting of small crystals), or monocrystalline silicon (mono-Si, a continuous crystal). Crystalline silicon is the dominant semiconducting material used in photovoltaic technology for the production of solar cells. These cells are assembled into solar panels as part of a photovoltaic system to generate solar power from sunlight. In electronics, crystalline silicon is typically the monocrystalline form of silicon, and is used for producing microchips.
Nuclear reactorA nuclear reactor is a device used to initiate and control a fission nuclear chain reaction or nuclear fusion reactions. Nuclear reactors are used at nuclear power plants for electricity generation and in nuclear marine propulsion. Heat from nuclear fission is passed to a working fluid (water or gas), which in turn runs through steam turbines. These either drive a ship's propellers or turn electrical generators' shafts. Nuclear generated steam in principle can be used for industrial process heat or for district heating.
Generation IV reactorGeneration IV reactors (Gen IV) are nuclear reactor design technologies that are envisioned as successors of generation III reactors. The Generation IV International Forum (GIF) - an international organization that coordinates the development of generation IV reactors - specifically selected six reactor technologies as candidates for generation IV reactors. The designs target improved safety, sustainability, efficiency, and cost.
Plasma-enhanced chemical vapor depositionPlasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by radio frequency (RF) (alternating current (AC)) frequency or direct current (DC) discharge between two electrodes, the space between which is filled with the reacting gases.
Chemical reactorA chemical reactor is an enclosed volume in which a chemical reaction takes place. In chemical engineering, it is generally understood to be a process vessel used to carry out a chemical reaction, which is one of the classic unit operations in chemical process analysis. The design of a chemical reactor deals with multiple aspects of chemical engineering. Chemical engineers design reactors to maximize net present value for the given reaction.
EpitaxyEpitaxy (prefix epi- means "on top of”) refers to a type of crystal growth or material deposition in which new crystalline layers are formed with one or more well-defined orientations with respect to the crystalline seed layer. The deposited crystalline film is called an epitaxial film or epitaxial layer. The relative orientation(s) of the epitaxial layer to the seed layer is defined in terms of the orientation of the crystal lattice of each material.
Molten salt reactorA molten salt reactor (MSR) is a class of nuclear fission reactor in which the primary nuclear reactor coolant and/or the fuel is a mixture of molten salt with a fissionable material. Two research MSRs operated in the United States in the mid-20th century. The 1950s Aircraft Reactor Experiment (ARE) was primarily motivated by the technology's compact size, while the 1960s Molten-Salt Reactor Experiment (MSRE) aimed to demonstrate a nuclear power plant using a thorium fuel cycle in a breeder reactor.
Physical vapor depositionPhysical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.
Vacuum depositionVacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.
