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Publication

Enhancement of optical quality factor by thermal annealing of single crystal diamond micro-resonators

Niels Quack, Teodoro Graziosi, Marcell Kristof Kiss, Sichen Mi
2018
Conference Papers

Abstract

We report on the increase in optical quality factor of a suspended single crystal diamond micro-disk resonator by thermal annealing. The resonators are fabricated by Deep Reactive Ion Etching (DRIE) to obtain circular pillars in bulk single crystal diamond, followed by multidirectional Focused Ion Beam (FIB) milling to shape the anchor, thin the micro disk and smooth the sidewalls. Thermal annealing in air at 500 degrees C for 4 h eliminates FIB induced crystal damage yielding optical quality factors of up to 5'700, corresponding to an increase of up to 5x compared to the resonators before annealing.

Official source

https://infoscience.epfl.ch/entities/publication/e668738a-fadf-4450-9f2f-3f735a79ee4d

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Niels Quack, Teodoro Graziosi, Marcell Kristof Kiss, Sichen Mi
2018
Conference Papers

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/e668738a-fadf-4450-9f2f-3f735a79ee4d

About this result

Related concepts (15)

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Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it. A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber, with a wafer platter situated in the bottom portion of the chamber.

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