Seismic intensity scalesSeismic intensity scales categorize the intensity or severity of ground shaking (quaking) at a given location, such as resulting from an earthquake. They are distinguished from seismic magnitude scales, which measure the magnitude or overall strength of an earthquake, which may, or perhaps may not, cause perceptible shaking. Intensity scales are based on the observed effects of the shaking, such as the degree to which people or animals were alarmed, and the extent and severity of damage to different kinds of structures or natural features.
Modified Mercalli intensity scaleThe modified Mercalli intensity scale (MM, MMI, or MCS), developed from Giuseppe Mercalli's Mercalli intensity scale of 1902, is a seismic intensity scale used for measuring the intensity of shaking produced by an earthquake. It measures the effects of an earthquake at a given location, distinguished from the earthquake's inherent force or strength as measured by seismic magnitude scales (such as the "" magnitude usually reported for an earthquake).
Peak ground accelerationPeak ground acceleration (PGA) is equal to the maximum ground acceleration that occurred during earthquake shaking at a location. PGA is equal to the amplitude of the largest absolute acceleration recorded on an accelerogram at a site during a particular earthquake. Earthquake shaking generally occurs in all three directions. Therefore, PGA is often split into the horizontal and vertical components. Horizontal PGAs are generally larger than those in the vertical direction but this is not always true, especially close to large earthquakes.
Richter magnitude scaleThe Richter scale (ˈrɪktər), also called the Richter magnitude scale, Richter's magnitude scale, and the Gutenberg–Richter scale, is a measure of the strength of earthquakes, developed by Charles Francis Richter and presented in his landmark 1935 paper, where he called it the "magnitude scale". This was later revised and renamed the local magnitude scale, denoted as ML or .
Thin filmA thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering.
EpitaxyEpitaxy (prefix epi- means "on top of”) refers to a type of crystal growth or material deposition in which new crystalline layers are formed with one or more well-defined orientations with respect to the crystalline seed layer. The deposited crystalline film is called an epitaxial film or epitaxial layer. The relative orientation(s) of the epitaxial layer to the seed layer is defined in terms of the orientation of the crystal lattice of each material.
Extreme ultraviolet lithographyExtreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography technology used in semiconductor device fabrication to make integrated circuits (ICs). It uses extreme ultraviolet (EUV) wavelengths near 13.5 nm, using a laser-pulsed tin (Sn) droplet plasma (Sn ions in the ionic states from Sn IX to Sn XIV give photon emission spectral peaks around 13.5 nm from 4p64dn - 4p54dn+1 + 4dn-14f ionic state transitions.), to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist.
X-rayX-ray radiation, or, much less commonly, X-radiation, is a penetrating form of high-energy electromagnetic radiation. Most X-rays have a wavelength ranging from 10 nanometers to 10 picometers, corresponding to frequencies in the range 30 petahertz to 30 exahertz (3e16Hz to 3e19Hz) and energies in the range 124 keV to 145 eV, respectively. X-ray wavelengths are shorter than those of UV rays and typically longer than those of gamma rays.
Copper indium gallium selenide solar cellA copper indium gallium selenide solar cell (or CIGS cell, sometimes CI(G)S or CIS cell) is a thin-film solar cell used to convert sunlight into electric power. It is manufactured by depositing a thin layer of copper indium gallium selenide solution on glass or plastic backing, along with electrodes on the front and back to collect current. Because the material has a high absorption coefficient and strongly absorbs sunlight, a much thinner film is required than of other semiconductor materials.
Electron-beam lithographyElectron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.
NanometreThe nanometre (international spelling as used by the International Bureau of Weights and Measures; SI symbol: nm) or nanometer (American spelling) is a unit of length in the International System of Units (SI), equal to one billionth (short scale) of a metre (0.000000001m) and to 1000 picometres. One nanometre can be expressed in scientific notation as 1e-9m, and as 1/1000000000 metres.
Low-energy electron diffractionLow-energy electron diffraction (LEED) is a technique for the determination of the surface structure of single-crystalline materials by bombardment with a collimated beam of low-energy electrons (30–200 eV) and observation of diffracted electrons as spots on a fluorescent screen. LEED may be used in one of two ways: Qualitatively, where the diffraction pattern is recorded and analysis of the spot positions gives information on the symmetry of the surface structure.
StepperA stepper is a device used in the manufacture of integrated circuits (ICs) that is similar in operation to a slide projector or a photographic enlarger. Stepper is short for step-and-repeat camera. Steppers are an essential part of the complex process, called photolithography, which creates millions of microscopic circuit elements on the surface of silicon wafers out of which chips are made. These chips form the heart of ICs such as computer processors, memory chips, and many other devices.
