Publication

Laser chemical vapor deposition of gallium and gallium arsenide

Hubert van den Bergh
1986
Journal Articles

Abstract

Expts. are described on the pyrolytic and photolytic laser chem. vapor deposition (LCVD) of Ga and GaAs, as well as hybrid deposition of the latter. Pyrolytic Ga deposits change in shape with laser power variations. A deposit in the shape of an annulus of .apprx.14 m outside diam. is obsd. at intermediate power densities. The deposited metal is amorphous. Ga photolytic deposits consist of small spheroids 10-20 nm in diam. and a metallic halo around the center of the deposit is again obsd. Both pyrolytic and photolytic LCVD of GaAs from a mixt. of Me3Ga and Me3As were unsuccessful.

Official source

https://infoscience.epfl.ch/entities/publication/d9bc2fe0-3e9d-4658-a038-d67514ff3268

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Hubert van den Bergh
1986
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/d9bc2fe0-3e9d-4658-a038-d67514ff3268

About this result

Related concepts (32)

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Physical vapor deposition

Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

Vacuum deposition

Vacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.

Related publications (30)

Laser chemical vapor deposition of gallium and gallium arsenide

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