Publication

Co-Sputtered Monocrystalline GeSn for Infrared Photodetection

Anna Fontcuberta i Morral, Andreas Schueler, Anna Krammer, Josef Andreas Schuler, Andrea Giunto, Luc Burnier, Nicolas Philippe Laurent Humblot
2020
Conference Papers

Abstract

We demonstrate monocrystalline growth of GeSn on Ge and Si substrates by co-sputtering. We discuss the evolution of film growth with thickness, elucidating the effects of substrate temperature, sputtering source, and the importance of hydrogen dilution in the plasma.

Official source

https://infoscience.epfl.ch/entities/publication/c143d215-a113-4830-af43-98499f0e583e

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Anna Fontcuberta i Morral, Andreas Schueler, Anna Krammer, Josef Andreas Schuler, Andrea Giunto, Luc Burnier, Nicolas Philippe Laurent Humblot
2020
Conference Papers

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/c143d215-a113-4830-af43-98499f0e583e

About this result

Related concepts (21)

Sputter deposition

Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV (100,000 K).

Vacuum deposition

Vacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.

Sputtering

In physics, sputtering is a phenomenon in which microscopic particles of a solid material are ejected from its surface, after the material is itself bombarded by energetic particles of a plasma or gas. It occurs naturally in outer space, and can be an unwelcome source of wear in precision components. However, the fact that it can be made to act on extremely fine layers of material is utilised in science and industry—there, it is used to perform precise etching, carry out analytical techniques, and deposit thin film layers in the manufacture of optical coatings, semiconductor devices and nanotechnology products.

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