Publication

Electrical Resistivity and Residual Stress in Sputtered Indium Tin Oxide Thin Films

Blaise François Cuénod, Rémy David Désiré Juttin
2025

Abstract

This article describes a study that investigated the electrical resistivity and residual stress in sputtered indium tin oxide (ITO) films. The study found that resistivity varies spatially with film thickness due to growth conditions and electron scattering, while stress transitions from tensile to compressive with increasing thickness. Understanding and controlling the electric resistivity and residual stress of ITO films is crucial for ensuring the performance and reliability of devices using these films.

Official source

https://infoscience.epfl.ch/entities/publication/b50f8231-5d81-403b-a313-5bdd7119f31a

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Electrical Resistivity and Residual Stress in Sputtered Indium Tin Oxide Thin Films

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