Plasma-enhanced chemical vapor depositionPlasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by radio frequency (RF) (alternating current (AC)) frequency or direct current (DC) discharge between two electrodes, the space between which is filled with the reacting gases.
Chemical vapor depositionChemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Pulsed laser depositionPulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films.
Atomic layer depositionAtomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants"). These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. A thin film is slowly deposited through repeated exposure to separate precursors.
Electron-beam physical vapor depositionElectron-beam physical vapor deposition, or EBPVD, is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase. These atoms then precipitate into solid form, coating everything in the vacuum chamber (within line of sight) with a thin layer of the anode material.
Nuclear reactorA nuclear reactor is a device used to initiate and control a fission nuclear chain reaction or nuclear fusion reactions. Nuclear reactors are used at nuclear power plants for electricity generation and in nuclear marine propulsion. Heat from nuclear fission is passed to a working fluid (water or gas), which in turn runs through steam turbines. These either drive a ship's propellers or turn electrical generators' shafts. Nuclear generated steam in principle can be used for industrial process heat or for district heating.
Physical vapor depositionPhysical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.
Breeder reactorA breeder reactor is a nuclear reactor that generates more fissile material than it consumes. These reactors can be fuelled with more commonly available isotopes of uranium and thorium, such as uranium-238 or thorium-232, as opposed to the rare uranium-235 which is used in conventional reactors. These materials are called fertile materials since they can be bred into fuel by these breeder reactors. Breeder reactors achieve this because their neutron economy is high enough to create more fissile fuel than they use.
Vacuum depositionVacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.
Sputter depositionSputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV (100,000 K).
Generation IV reactorGeneration IV reactors (Gen IV) are nuclear reactor design technologies that are envisioned as successors of generation III reactors. The Generation IV International Forum (GIF) - an international organization that coordinates the development of generation IV reactors - specifically selected six reactor technologies as candidates for generation IV reactors. The designs target improved safety, sustainability, efficiency, and cost.
Light-water reactorThe light-water reactor (LWR) is a type of thermal-neutron reactor that uses normal water, as opposed to heavy water, as both its coolant and neutron moderator; furthermore a solid form of fissile elements is used as fuel. Thermal-neutron reactors are the most common type of nuclear reactor, and light-water reactors are the most common type of thermal-neutron reactor. There are three varieties of light-water reactors: the pressurized water reactor (PWR), the boiling water reactor (BWR), and (most designs of) the supercritical water reactor (SCWR).
Research reactorResearch reactors are nuclear fission-based nuclear reactors that serve primarily as a neutron source. They are also called non-power reactors, in contrast to power reactors that are used for electricity production, heat generation, or maritime propulsion. The neutrons produced by a research reactor are used for neutron scattering, non-destructive testing, analysis and testing of materials, production of radioisotopes, research and public outreach and education.
Molten salt reactorA molten salt reactor (MSR) is a class of nuclear fission reactor in which the primary nuclear reactor coolant and/or the fuel is a mixture of molten salt with a fissionable material. Two research MSRs operated in the United States in the mid-20th century. The 1950s Aircraft Reactor Experiment (ARE) was primarily motivated by the technology's compact size, while the 1960s Molten-Salt Reactor Experiment (MSRE) aimed to demonstrate a nuclear power plant using a thorium fuel cycle in a breeder reactor.
Pressurized water reactorA pressurized water reactor (PWR) is a type of light-water nuclear reactor. PWRs constitute the large majority of the world's nuclear power plants (with notable exceptions being the UK, Japan and Canada). In a PWR, the primary coolant (water) is pumped under high pressure to the reactor core where it is heated by the energy released by the fission of atoms. The heated, high pressure water then flows to a steam generator, where it transfers its thermal energy to lower pressure water of a secondary system where steam is generated.
Small modular reactorSmall modular reactors (SMRs) are a proposed class of nuclear fission reactors, smaller than conventional nuclear reactors, which can be built in one location (such as a factory), then shipped, commissioned, and operated at a separate site. The term SMR refers to the size, capacity and modular construction only, not to the reactor type and the nuclear process which is applied. Designs range from scaled down versions of existing designs to generation IV designs.
PumpA pump is a device that moves fluids (liquids or gases), or sometimes slurries, by mechanical action, typically converted from electrical energy into hydraulic energy. Mechanical pumps serve in a wide range of applications such as pumping water from wells, aquarium filtering, pond filtering and aeration, in the car industry for water-cooling and fuel injection, in the energy industry for pumping oil and natural gas or for operating cooling towers and other components of heating, ventilation and air conditioning systems.
SputteringIn physics, sputtering is a phenomenon in which microscopic particles of a solid material are ejected from its surface, after the material is itself bombarded by energetic particles of a plasma or gas. It occurs naturally in outer space, and can be an unwelcome source of wear in precision components. However, the fact that it can be made to act on extremely fine layers of material is utilised in science and industry—there, it is used to perform precise etching, carry out analytical techniques, and deposit thin film layers in the manufacture of optical coatings, semiconductor devices and nanotechnology products.
Plasma (physics)Plasma () is one of four fundamental states of matter, characterized by the presence of a significant portion of charged particles in any combination of ions or electrons. It is the most abundant form of ordinary matter in the universe, being mostly associated with stars, including the Sun. Extending to the rarefied intracluster medium and possibly to intergalactic regions, plasma can be artificially generated by heating a neutral gas or subjecting it to a strong electromagnetic field.
Generation III reactorGeneration III reactors, or Gen III reactors, are a class of nuclear reactors designed to succeed Generation II reactors, incorporating evolutionary improvements in design. These include improved fuel technology, higher thermal efficiency, significantly enhanced safety systems (including passive nuclear safety), and standardized designs intended to reduce maintenance and capital costs. They are promoted by the Generation IV International Forum (GIF).
