A ratiometric fluorescence sensor for caffeine

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Spatially non-local aspects of turbulent transport in tokamak plasmas are examined with global gyrokinetic simulations using the ORB5 code. Inspired by very accurate measurements in the TCV tokamak in L-mode, we initialise plasma profiles with constant log ...

In this paper we derive a series expansion for the price of a continuously sampled arithmetic Asian option in the Black-Scholes setting. The expansion is based on polynomials that are orthogonal with respect to the log-normal distribution. All terms in the ...

Displacement data modelling is of great importance for the safety control of concrete dams. The commonly used artificial intelligence method modelled the displacement data at each monitoring point individually, i.e., the data correlations between the monit ...

In this paper, we report on SwissSPAD2, an image sensor with 512 x 512 photon-counting pixels, each comprising a single-photon avalanche diode (SPAD), a 1-b memory, and a gating mechanism capable of turning the SPAD ON and OFF, with a skew of 250 and 344 p ...

Cellular uptake and intracellular trafficking of polymer conjugates or polymer nanoparticles is typically monitored using fluorescence-based techniques such as confocal microscopy. While these methods have provided a wealth of insight into the internalizat ...

The efficiency of stochastic particle schemes for large scale simulations relies on the ability to preserve a uniform distribution of particles in the whole physical domain. While simple particle split and merge algorithms have been considered previously, ...

In this paper we propose a novel layered-printing method consisting of superposed visible cmy and invisible fluorescent ultraviolet (UV) rgb inks. Our approach can be used to generate a variety of visual color-alteration effects such as revealing two compl ...

The integration of the heating and current drive (HCD) systems in the EU DEMO tokamak must address a number of issues, namely space constraints in the tokamak building, remote handling requirements, breeding blanket penetration, neutron and photon radiatio ...

Mask-aligner photolithography is a technology used to replicate patterns from a mask to a photosensitive substrate. It is widely used in the fabrication of MEMS and micro-optical components, and for other applications with dimensions in the micrometer rang ...

This thesis studies the valuation and hedging of financial derivatives, which is fundamental for trading and risk-management operations in financial institutions. The three chapters in this thesis deal with derivatives whose payoffs are linked to interest ...

Mask-aligner lithography is traditionally performed using mercury arc lamps with wavelengths ranging from 250 nm to 600 nm with intensity peaks at the i, g and h lines. Since mercury arc lamps present several disadvantages, it is of interest to replace the ...

Mask-aligner lithography is a technology used to transfer patterns with critical dimensions in the micrometer range from below 1 micron for contact printing to a dozen of microns in proximity printing. This technology is widely used in the fabrication of M ...

A ratiometric fluorescence sensor for caffeine

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Global turbulence features across marginality and non-local pedestal-core interactions

Asian option pricing with orthogonal polynomials

Concrete Dam Displacement Prediction Based on an ISODATA-GMM Clustering and Random Coefficient Model

A 512 x 512 SPAD Image Sensor With Integrated Gating for Widefield FLIM

Cellular Uptake and Intracellular Trafficking of Poly(N-(2-Hydroxypropyl) Methacrylamide)

Particle number control for direct simulation Monte-Carlo methodology using kernel estimates

Magic Prints: Image-Changing Prints Observed under Visible and 365 nm UV Light

Initial port integration concept for EC and NB systems in EU DEMO tokamak

High power ultraviolet LED illumination systems: coherence properties and applications in photolithography

Pricing interest rate, dividend, and equity risk

High-power modular LED-based illumination systems for mask-aligner lithography

High power modular LED-based illumination system for lithography applications