Publication

Method for deposition of a sensor on a conductive substrate

Related publications (29)

Limitations of Proximity Lithography Printing : Simulations, Experiments, and Applications

Photolithography is one of the earliest technologies used to transfer patterns to a substrate. It is also known as optical lithography since it uses light to transfer the pattern. The main exposure techniques exist in the industry are projection printing, ...

EPFL2017

Novel manufacturing methods for optical antennas : controlling light down to the single nanometer scale

Valentin Flauraud

The resonant excitation of free electrons in metallic nanostructures enables extreme near field intensities along with a deep sub-wavelength localization of the electromagnetic energy. This has been exploited to enhance light-matter interaction down to the ...

EPFL2017

Top-Down Technique for Scaling toNnano in Silicon MEMS

Yusuf Leblebici, Zuhal Tasdemir, Yasin Kilinc, Mustafa Yilmaz

Nanoscale building blocks impart added functionalities to microelectromechanical systems (MEMS). The integration of silicon nanowires with MEMS-based sensors leading to miniaturization with improved sensitivity and higher noise immunity is one example high ...

American Vacuum Society2017

Coherence management in lithography printing systems

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

In proximity lithography, interference and diffraction effects arise when printing small features because of the proximity gap. Different techniques are used in order to control and take advantage of theses effects. In this paper, the focus is set on the M ...

Spie-Int Soc Optical Engineering2016

2-homopiperazine-1-yl-4h-1,3-benzothiazine-4-one derivatives and process for the preparation of 2- (homo)piperazine 1,3-benzothiazine-4-one hydrochlorides

2-homopiperazine-1-yl-4H-l, 3 -bensothiazine-4-one derivatives of formula (I) are provided. They are useful in the treatment of bacterial infections, in particular tuberculosis, buruli ulcer and leprosy. A process for the preparation of 2- (homo)piperazine ...

2016

Lightfields behind amplitude masks: Creating phase discontinuities

Hans Peter Herzig, Wilfried Noell, Myun Sik Kim, Toralf Scharf, Krishnaparvathy Puthankovilakam

Shaping of light fields behind amplitude and phase masks the basis the lithographic structure reproduction. The aerial image or better the intensity distribution defines the resolution of the structure to be printed. Contrast is the main parameter and to a ...

Ieee2016

Panel: Looking Backwards and Forwards

Giovanni De Micheli

Ten years ago, at 90 nanometers, EDA was challenged and deemed inadequate in dealing with increasing complexity, power consumption, and sub-wavelength lithography, thus harming the progress of mobile phones. Today, at 10 nanometers, integration capacity ha ...

IEEE2016

Combined water and energy integration in industrial processes with restricted connections

François Maréchal, Maziar Kermani, Ivan Daniel Kantor

Reducing the environmental impact of industrial processes is highly linked with decreasing consumption of natural resources, energy, and water. In the context of climate change, as discussed during the Conference of Parties in Paris (COP21), the efficient ...

2016

Effects as Implicit Capabilities

Martin Odersky

We propose to investigate a new approach to effect checking that has an elegant solution to the effect polymorphism problem. The central idea is that instead of talking about effects we talk about capabilities. For instance, instead of saying a function “t ...

2015