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We present results of the design, materials and fabrication of 96×96 and 288×162 InP/InGaAs avalanche photodiode arrays for Geiger-mode operation in the shortwave infrared wavelength band. The arrays use a planar device architecture and are fabricated using a process combining selective area growth and a single Zn diffusion to mitigate edge breakdown effects. Measurements were performed on test pixels included in the chip design. The dark count rate is reported as a function of bias and temperature conditions.