Method and system for fabricating glass-based nanostructures on large-area planar substrates, fibers, and textiles

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We present electron- and hole-selective passivating contacts based on wet-chemically grown interfacial SiOx and overlying in-situ doped silicon carbide (SiCx) deposited by plasma-enhanced chemical vapor deposition. After annealing at 850 degrees C, excelle ...

Method and system for fabricating glass-based nanostructures on large-area planar substrates, fibers, and textiles

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Pattern formation in thin liquid films: from coating-flow instabilities to microfluidic droplets

Spatial and Morphological Control of Cyanine Dye Thin Films

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Crystalline Silicon Solar Cells With Coannealed Electron- and Hole-Selective SiCx Passivating Contacts