Publication

Self Aligned Concentric Nanostructures Formed by E-beam Overexposure of PMMA and Single Post Processing Steps

Nico de Rooij
2011
Posters

Abstract

We demonstrate the ability to control the creation of self aligned nanostructures by e-beam lithography, where a central nanopillar with circular rim is created in a single e-beam exposure [1,2]. This characteristic shape is formed by the energy density distribution of incident, forwardscattered and backscattered electrons [3] and reflects the dual behavior of PMMA as positive and negative e-beam resist. In addition, the high energy incident electrons have a confined heating effect on the PMMA and carbonize the polymer from top to bottom. At the same time, electrons backscattered from the underlying material will break the polymeric bonds around thiscarbonized region and render the PMMA soluble in developer solution.

Official source

https://infoscience.epfl.ch/entities/publication/6882518c-145c-42a5-975e-8b691aa04189

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Nico de Rooij
2011
Posters

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/6882518c-145c-42a5-975e-8b691aa04189

About this result

Related concepts (32)

Electron-beam lithography

Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.

Electron microscope

An electron microscope is a microscope that uses a beam of electrons as a source of illumination. They use electron optics that are analogous to the glass lenses of an optical light microscope. As the wavelength of an electron can be up to 100,000 times shorter than that of visible light, electron microscopes have a higher resolution of about 0.1 nm, which compares to about 200 nm for light microscopes.

Scanning electron microscope

A scanning electron microscope (SEM) is a type of electron microscope that produces images of a sample by scanning the surface with a focused beam of electrons. The electrons interact with atoms in the sample, producing various signals that contain information about the surface topography and composition of the sample. The electron beam is scanned in a raster scan pattern, and the position of the beam is combined with the intensity of the detected signal to produce an image.

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Self Aligned Concentric Nanostructures Formed by E-beam Overexposure of PMMA and Single Post Processing Steps

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