Publications related to Localized Ion Implantation Through Micro/Nanostencil Masks

Related publications (12)

Laser-Induced Forward Transfer of Functional Microdevices

Laser-induced forward transfer (LIFT) technique is an emerging micro additive manufacturing (AM) technique that has been widely used to print a variety of materials. Distinguished from other nozzle-based AM techniques, LIFT operates without the existence o ...

EPFL2023

Fabrication of plasmonic structures with well-controlled nanometric features: a comparison between lift-off and ion beam etching

Olivier Martin, Christian Santschi, Banafsheh Abasahl

After providing a detailed overview of nanofabrication techniques for plasmonics, we discuss in detail two different approaches for the fabrication of metallic nanostructures based on e-beam lithography. The first approach relies on a negative e-beam resis ...

IOP PUBLISHING LTD2021

Limitations of Proximity Lithography Printing : Simulations, Experiments, and Applications

Krishnaparvathy Puthankovilakam

Photolithography is one of the earliest technologies used to transfer patterns to a substrate. It is also known as optical lithography since it uses light to transfer the pattern. The main exposure techniques exist in the industry are projection printing, ...

EPFL2017

Top-Down Technique for Scaling toNnano in Silicon MEMS

Yusuf Leblebici, Zuhal Tasdemir

Nanoscale building blocks impart added functionalities to microelectromechanical systems (MEMS). The integration of silicon nanowires with MEMS-based sensors leading to miniaturization with improved sensitivity and higher noise immunity is one example high ...

American Vacuum Society2017

Fabrication defects and grating couplers in III-nitride photonic crystal nanobeam lasers (Conference Presentation)

Nicolas Grandjean, Jean-François Carlin, Raphaël Butté, Ian Michael Rousseau

We report a numerical and experimental investigation of fabrication tolerances and outcoupling in optically pumped III-nitride nanolasers operating near lambda = 460 nm, in which feedback is provided by a one-dimensional photonic crystal nanobeam cavity an ...

Spie-Int Soc Optical Engineering2016

Application of stencil masks for ion beam lithographic patterning

Jürgen Brugger, Andreea Veronica Savu

The application of Au/Si3N4 stencil masks for the transfer of patterns using different MeV-ion beams with various substrates has been investigated. The techniques investigated were namely, conventional lithography with positive- and negative-tone resist po ...

Elsevier2013

Improvement of the open circuit voltage by modifying the transparent ITO front electrode in amorphous n-i-p solar cells

Christophe Ballif, Franz-Josef Haug, Frank Jonathan Leresche, Rémi Biron

At the front contact of thin film silicon solar cells, the junction between the p-doped window layer and the n-type transparent electrode results in a barrier that must be surmounted by the charge carriers. The barrier height is governed by the work functi ...

Wiley-Blackwell2012

Self-assembled photosystem-I biophotovoltaics on nanostructured TiO2 and ZnO

Michael Graetzel, Mohammad Khaja Nazeeruddin

The abundant pigment-protein membrane complex photosystem-I (PS-I) is at the heart of the Earth's energy cycle. It is the central molecule in the "Z-scheme'' of photosynthesis, converting sunlight into the chemical energy of life. Commandeering this intric ...

Nature Publishing Group2012

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Andreea Veronica Savu, Oscar Vazquez Mena

In this work, nanosphere lithography was integrated with standard microfabrication for the wafer-scale fabrication of silicon nitride (SiN) membranes with arrays of submicrometer holes. A monolayer of polystyrene (PS) beads with a mean diameter of 428 or 5 ...

2011

Biomolecule Patterning on Analytical Devices: A Microfabrication-Compatible Approach

Guillaume Suarez

The present work describes a methodology for patterning biomolecules on silicon-based analytical devices that reconciles 3-D biological functionalization with standard resist lift-off techniques. Unlike classic sol gel approaches in which the biomolecule o ...

2010

Stencil assisted reactive ion etching for micro and nano patterning

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Stencil-assisted oxygen reactive ion etching is a low-cost and parallel process for the replication of micrometric and nanometric patterns in any organic material. This lithography process allows the patterning of organic material non sensitive to electron ...

2008

Fabrication of metallic patterns by microstencil lithography on polymer surfaces suitable as microelectrodes in integrated microfluidic systems

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Nao Takano

Microstencil lithography, i.e. local deposition of micrometer scale patterns through small shadow masks, is a promising method for metal micropattern definition on polymer substrates that cannot be structured using organic-solvent-based photoresist technol ...

2006