Publication

Temperature effects in the photolytic LCVD of platinum

Hubert van den Bergh
1989
Journal Articles

Abstract

The photolytic laser chem. vapor deposition (LCVD) rate of Pt from its hexafluoroacetylacetonate complex precursor was measured in situ and in real time. Optical transmission of the 350 nm photolysis light through the deposited Pt film and a transparent glass substrate is monitored and analyzed in detail. From these measurements, as well as measurements of the reflected light, the fraction of the laser beam power adsorbed in the metal film is found. The latter allows a simple est. of the laser-induced temp. rise at the metal surface. Even small temp. increases can completely change the photolysis mechanism and hence drastically influence the photolytic LCVD rate. A simple modification of Lax's model, in which a temp.-dependent thermal cond. of the substrate is introduced, is used to describe the laser-induced heating of a strongly-absorbing thin metal film on a glass substrate.

Official source

https://infoscience.epfl.ch/entities/publication/616930f0-73d3-4c9d-848b-d9cb84fe0a01

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Graph Chat

Chat with Graph Search

Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.

DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.

Hubert van den Bergh
1989
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/616930f0-73d3-4c9d-848b-d9cb84fe0a01

About this result

Related concepts (32)

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Physical vapor deposition

Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

Vacuum deposition

Vacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.

Related publications (3)

Temperature effects in the photolytic LCVD of platinum

Chat with Graph Search

Vertically Stacked Boron Nitride/Graphene Heterostructure for Tunable Antiresonant Hollow-Core Fiber

Low-temperature thick-film dielectrics stabilised by reaction with a nanocrystalline powder

Formation and properties of nanometer-thick platinum silicide layers