Publication

Glass for photonics: insight in the glass properties obtained under laser fs writing via point defects analysis

Yves Bellouard
2024

Abstract

Multi-scale 3D architecture with highly localized fluorescence contrast in photosensitive silver-containing glasses by means of femtosecond laser writing can be obtained. We will present results obtained on electron-irradiated glass samples by EPR spectroscopy and in-situ cathodoluminescence. This allowed for understanding the initial phenomena of electron deposition and charge trapping by identifying the nature of point defects and Ag species. In addition, a careful point defects analysis of fs-laser written silica glass as a function of the laser deposited energy for [50-500 fs] pulse durations was leaded highlighted the role of certain defects in the chemical etching of fused silica glass

Official source

https://infoscience.epfl.ch/entities/publication/4b91cbc0-6af2-48c0-af22-dda1364aecec

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Yves Bellouard
2024

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/4b91cbc0-6af2-48c0-af22-dda1364aecec

About this result

Related concepts (32)

Glass

Glass is a non-crystalline solid that is often transparent, brittle and chemically inert. It has widespread practical, technological, and decorative use in, for example, window panes, tableware, and optics. Glass is most often formed by rapid cooling (quenching) of the molten form; some glasses such as volcanic glass are naturally occurring. The most familiar, and historically the oldest, types of manufactured glass are "silicate glasses" based on the chemical compound silica (silicon dioxide, or quartz), the primary constituent of sand.

Pulsed laser deposition

Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films.

Electron-beam physical vapor deposition

Electron-beam physical vapor deposition, or EBPVD, is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase. These atoms then precipitate into solid form, coating everything in the vacuum chamber (within line of sight) with a thin layer of the anode material.

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Glass for photonics: insight in the glass properties obtained under laser fs writing via point defects analysis

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