Publication

Microstructural and electrical properties of (Sr,Ba)Nb2O6 thin films grown by pulsed laser deposition

Nava Setter, Paul Muralt, Alexander Tagantsev, Marco Cantoni, Anna Infortuna
2004
Journal Articles

Abstract

Strontium barium niobate thin films have been deposited by pulsed laser deposition on (111)-textured Pt films, p-doped Si(I 00) and Nb doped STO (SrTiO3) single crystals. The deposition parameters were optimized for obtaining phase pure (001)-oriented films from stochiometric targets. The samples were annealed in oxygen to improve top electrode adhesion and reduce oxygen vacancies. The SBN/substrate interfaces were investigated by means of TEM combined with EDAX chemical analysis. Growth on silicon resulted in the formation of a few nm thick SiO2 interface layer. Epitaxial growth has been obtained on STO. A broad relaxor-type or diffuse phase transition occurs around -50 degreesC well below the transition temperature of single crystals. A second dielectric anomaly is observed around 80 degreesC, which, however, disappears after annealing in O-2. Above,the dielectric loss increases exponentially due to presumed leakage by ion conduction. Hysteresis loops at room temperature confirm relaxor-type behaviour with a saturation polarization of 18 muC/cm(2) and a weak hysteresis with a coercive field of 50 kV/cm. (C) 2003 Elsevier Ltd. All rights reserved.

Official source

https://infoscience.epfl.ch/entities/publication/43625400-d93c-44b2-9a69-225e318ea676

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Nava Setter, Paul Muralt, Alexander Tagantsev, Marco Cantoni, Anna Infortuna
2004
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/43625400-d93c-44b2-9a69-225e318ea676

About this result

Related concepts (32)

Pulsed laser deposition

Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films.

Physical vapor deposition

Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

Hysteresis

Hysteresis is the dependence of the state of a system on its history. For example, a magnet may have more than one possible magnetic moment in a given magnetic field, depending on how the field changed in the past. Plots of a single component of the moment often form a loop or hysteresis curve, where there are different values of one variable depending on the direction of change of another variable. This history dependence is the basis of memory in a hard disk drive and the remanence that retains a record of the Earth's magnetic field magnitude in the past.

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Microstructural and electrical properties of (Sr,Ba)Nb2O6 thin films grown by pulsed laser deposition

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