Multi-parametric surface plasmon resonanceMulti-parametric surface plasmon resonance (MP-SPR) is based on surface plasmon resonance (SPR), an established real-time label-free method for biomolecular interaction analysis, but it uses a different optical setup, a goniometric SPR configuration. While MP-SPR provides same kinetic information as SPR (equilibrium constant, dissociation constant, association constant), it provides also structural information (refractive index, layer thickness). Hence, MP-SPR measures both surface interactions and nanolayer properties.
A Dynamical Theory of the Electromagnetic Field"A Dynamical Theory of the Electromagnetic Field" is a paper by James Clerk Maxwell on electromagnetism, published in 1865. In the paper, Maxwell derives an electromagnetic wave equation with a velocity for light in close agreement with measurements made by experiment, and deduces that light is an electromagnetic wave. Following standard procedure for the time, the paper was first read to the Royal Society on 8 December 1864, having been sent by Maxwell to the society on 27 October.
Radio propagationRadio propagation is the behavior of radio waves as they travel, or are propagated, from one point to another in vacuum, or into various parts of the atmosphere. As a form of electromagnetic radiation, like light waves, radio waves are affected by the phenomena of reflection, refraction, diffraction, absorption, polarization, and scattering. Understanding the effects of varying conditions on radio propagation has many practical applications, from choosing frequencies for amateur radio communications, international shortwave broadcasters, to designing reliable mobile telephone systems, to radio navigation, to operation of radar systems.
TensorIn mathematics, a tensor is an algebraic object that describes a multilinear relationship between sets of algebraic objects related to a vector space. Tensors may map between different objects such as vectors, scalars, and even other tensors. There are many types of tensors, including scalars and vectors (which are the simplest tensors), dual vectors, multilinear maps between vector spaces, and even some operations such as the dot product.
Nanoimprint lithographyNanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
LightLight or visible light is electromagnetic radiation that can be perceived by the human eye. Visible light is usually defined as having wavelengths in the range of 400–700 nanometres (nm), corresponding to frequencies of 750–420 terahertz, between the infrared (with longer wavelengths) and the ultraviolet (with shorter wavelengths). In physics, the term "light" may refer more broadly to electromagnetic radiation of any wavelength, whether visible or not. In this sense, gamma rays, X-rays, microwaves and radio waves are also light.
Line-of-sight propagationLine-of-sight propagation is a characteristic of electromagnetic radiation or acoustic wave propagation which means waves can only travel in a direct visual path from the source to the receiver without obstacles. Electromagnetic transmission includes light emissions traveling in a straight line. The rays or waves may be diffracted, refracted, reflected, or absorbed by the atmosphere and obstructions with material and generally cannot travel over the horizon or behind obstacles.
Waveguide (optics)An optical waveguide is a physical structure that guides electromagnetic waves in the optical spectrum. Common types of optical waveguides include optical fiber waveguides, transparent dielectric waveguides made of plastic and glass, liquid light guides, and liquid waveguides. Optical waveguides are used as components in integrated optical circuits or as the transmission medium in local and long-haul optical communication systems.
Electron-beam lithographyElectron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.
PhotolithographyIn integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.
Tensor productIn mathematics, the tensor product of two vector spaces V and W (over the same field) is a vector space to which is associated a bilinear map that maps a pair to an element of denoted An element of the form is called the tensor product of v and w. An element of is a tensor, and the tensor product of two vectors is sometimes called an elementary tensor or a decomposable tensor. The elementary tensors span in the sense that every element of is a sum of elementary tensors.
NanolithographyNanolithography (NL) is a growing field of techniques within nanotechnology dealing with the engineering (patterning e.g. etching, depositing, writing, printing etc) of nanometer-scale structures on various materials. The modern term reflects on a design of structures built in range of 10−9 to 10−6 meters, i.e. nanometer scale. Essentially, the field is a derivative of lithography, only covering very small structures. All NL methods can be categorized into four groups: photo lithography, scanning lithography, soft lithography and other miscellaneous techniques.
