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The present invention relates to a microchannel plate (1) having an array of channels (5), wherein said microchannel plate comprises a substrate (2) and, deposited on said substrate, a hydrogenated amorphous silicon film (3) having a thickness comprised between 50 [mu]m and 200 [mu]m, preferably comprised between 80 [mu]m and 120 [mu]m, said film comprising said array of channels (5). Preferably, the substrate (2) is an integrated circuit comprising an internal electronic readout circuit and pixilated collection electrodes (8), and the film (3) is integrated on said substrate (2). The channels (5) may be formed by a Deep Reactive Ion Etching (DRIE) process.
Luis Guillermo Villanueva Torrijo, Marco Liffredo, Silvan Stettler, Nan Xu, Federico Peretti
Tobias Kippenberg, Johann Emmeram Riemensberger, Mikhail Churaev, Xinru Ji, Terence Albert Emile Blésin, Chengli Wang, Zihan Li, Junyin Zhang, Xi Wang, Chen Yang, Wil Kao