The present invention relates to a microchannel plate (1) having an array of channels (5), wherein said microchannel plate comprises a substrate (2) and, deposited on said substrate, a hydrogenated amorphous silicon film (3) having a thickness comprised between 50 [mu]m and 200 [mu]m, preferably comprised between 80 [mu]m and 120 [mu]m, said film comprising said array of channels (5). Preferably, the substrate (2) is an integrated circuit comprising an internal electronic readout circuit and pixilated collection electrodes (8), and the film (3) is integrated on said substrate (2). The channels (5) may be formed by a Deep Reactive Ion Etching (DRIE) process.
Federico Peretti, Luis Guillermo Villanueva Torrijo, Silvan Stettler, Marco Liffredo, Nan Xu
Tobias Kippenberg, Johann Emmeram Riemensberger, Mikhail Churaev, Xinru Ji, Zihan Li, Terence Albert Emile Blésin, Chengli Wang, Junyin Zhang, Xi Wang, Chen Yang, Wil Kao, Alisa Davydova