Publication

Light-coupling masks for lensless, sub-wavelength optical lithography

1998
Journal Articles

Abstract

Light-coupling masks (LCMs) based on structured organic polymers that make conformal contact with a substrate can constitute an amplitude mask for light-based lithographies. The LCM is exposed through its backside, from where the light is differentially guided by the structures towards the substrate. Images of arbitrarily shaped features having dimensions much smaller than that of the vacuum wavelength of the exposing light are formed in the resist in a 1:1 correspondence to their size in light-guiding portions of the mask. LCMs allow pattern replication at high resolution and densities over large areas in photoresist without the need for elaborate projection optics. (C) 1998 American Institute of Physics. [S0003-6951(98)04319-8].

Official source

https://infoscience.epfl.ch/entities/publication/380ef940-8e8b-4432-b38a-9ea4bf261a88

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1998
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/380ef940-8e8b-4432-b38a-9ea4bf261a88

About this result

Related concepts (32)

Photolithography

In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.

Extreme ultraviolet lithography

Extreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography technology used in semiconductor device fabrication to make integrated circuits (ICs). It uses extreme ultraviolet (EUV) wavelengths near 13.5 nm, using a laser-pulsed tin (Sn) droplet plasma (Sn ions in the ionic states from Sn IX to Sn XIV give photon emission spectral peaks around 13.5 nm from 4p64dn - 4p54dn+1 + 4dn-14f ionic state transitions.), to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist.

Interference lithography

Interference lithography (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. The basic principle is the same as in interferometry or holography. An interference pattern between two or more coherent light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima.

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Light-coupling masks for lensless, sub-wavelength optical lithography

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