Publication

Problems in DSA coating deposition by thermal decomposition

Christos Comninellis
1991
Journal Articles

Abstract

Several DSA (dimensionally stable anode) coatings were prepd. by thermal decompn. of metal chloride salts on a Ti base. The painting compn. does not necessarily correspond to the final coating compn. Thermogravimetric and x-ray fluorescence measurements were used to identify and characterize the material losses. The IrO2, Ta2O5, and RuO2 compds. can be deposited with .apprx.100% yield, while SnO2 and Pt precursors give high material losses. The influence of parameters affecting the deposition yield is discussed. [on SciFinder (R)]

Official source

https://infoscience.epfl.ch/entities/publication/315aa12e-34b1-4756-a17f-894739878a21

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Christos Comninellis
1991
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/315aa12e-34b1-4756-a17f-894739878a21

About this result

Related concepts (18)

X-ray fluorescence

X-ray fluorescence (XRF) is the emission of characteristic "secondary" (or fluorescent) X-rays from a material that has been excited by being bombarded with high-energy X-rays or gamma rays. The phenomenon is widely used for elemental analysis and chemical analysis, particularly in the investigation of metals, glass, ceramics and building materials, and for research in geochemistry, forensic science, archaeology and art objects such as paintings.

Thermal analysis

Thermal analysis is a branch of materials science where the properties of materials are studied as they change with temperature.

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

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Problems in DSA coating deposition by thermal decomposition

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