Publication

In-situ stabilization of membranes for improved large-area and high-density nanostencil lithography

2005
Posters

Abstract

Patterning of micro- and nanometer scale structures by means of nanostencils (shadow masks) is increasingly being used as a simple, clean and low-cost alternative to photolithography. It can be shown, that sub-100-nm scale features can be fabricated through 100-nm thick membranes. Currently, large area pattern transfer using nanostencil lithography is limited by the mechanical stability of the shadow-mask membrane itself. The reason is that the deposited material induces undesirable stress in the membrane causing excessive bending or breakage and consequent loss in dimensional control. In this contribution, a remedy for the fabrication and application of nanostencils that are suitable for the creation of high-density nanopatterns on large surface areas is presented. The improved nanostencils incorporate in-situ, local stabilization structures increasing their moment of inertia, I, which is the structural property directly related to deformability.

Official source

https://infoscience.epfl.ch/entities/publication/28d7627c-612d-49b6-b0f1-ec28c6c38f36

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2005
Posters

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/28d7627c-612d-49b6-b0f1-ec28c6c38f36

About this result

Related concepts (25)

Nanolithography

Nanolithography (NL) is a growing field of techniques within nanotechnology dealing with the engineering (patterning e.g. etching, depositing, writing, printing etc) of nanometer-scale structures on various materials. The modern term reflects on a design of structures built in range of 10−9 to 10−6 meters, i.e. nanometer scale. Essentially, the field is a derivative of lithography, only covering very small structures. All NL methods can be categorized into four groups: photo lithography, scanning lithography, soft lithography and other miscellaneous techniques.

Nanotechnology

Nanotechnology, often shortened to nanotech, is the use of matter on atomic, molecular, and supramolecular scales for industrial purposes. The earliest, widespread description of nanotechnology referred to the particular technological goal of precisely manipulating atoms and molecules for fabrication of macroscale products, also now referred to as molecular nanotechnology. A more generalized description of nanotechnology was subsequently established by the National Nanotechnology Initiative, which defined nanotechnology as the manipulation of matter with at least one dimension sized from 1 to 100 nanometers (nm).

Dip-pen nanolithography

Dip pen nanolithography (DPN) is a scanning probe lithography technique where an atomic force microscope (AFM) tip is used to create patterns directly on a range of substances with a variety of inks. A common example of this technique is exemplified by the use of alkane thiolates to imprint onto a gold surface. This technique allows surface patterning on scales of under 100 nanometers.

Related publications (4)

In-situ stabilization of membranes for improved large-area and high-density nanostencil lithography

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