Publication

Microcolumn with variable axis lens for large scan fields and pixel numbers

Nico de Rooij
2011
Journal Articles

Abstract

A microcolumn is presented containing a variable axis lens optimized for large scan fields and pixel numbers with minimal probe sizes for the deflected beam. At beam energy of 1 keV and a working distance of 38 mm the magnifying column can address scan fields of more than 7 x 7 mm(2) employing dynamic correction. Simulations of the design predict a probe diameter of 75 nm on axis up to similar to 1 mu m for a beam being deflected 5 mm of axis, assuming a field emission source. Within a scan field of 3 x 3 mm(2) this microcolumn could address over 1 gigapixels of less than 100 nm in size. Tests of the column, using the 135 nm probe of a SEM as the source, resulted in a beam size of similar to 720 nm on axis and up to 1.1 mu m for a beam deflected 5 mm off axis, consistent with simulations. (C) 2011 Elsevier B.V. All rights reserved.

Official source

https://infoscience.epfl.ch/entities/publication/264f20ee-a17e-4b72-9707-fb856eaa1d9e

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Graph Chat

Chat with Graph Search

Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.

DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.

Nico de Rooij
2011
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/264f20ee-a17e-4b72-9707-fb856eaa1d9e

About this result

Related concepts (32)

Electron-beam lithography

Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.

I-beam

I-beam is a generic lay term for a variety of structural members with an or -shaped cross-section. Technical terms for similar items include H-beam (for universal column, UC), w-beam (for "wide flange"), universal beam (UB), rolled steel joist (RSJ), or double-T (especially in Polish, Bulgarian, Spanish, Italian and German). I-beams are typically made of structural steel and serve a wide variety of construction uses. The horizontal elements of the are called flanges, and the vertical element is known as the "web".

CT scan

A computed tomography scan (usually abbreviated to CT scan; formerly called computed axial tomography scan or CAT scan) is a medical imaging technique used to obtain detailed internal images of the body. The personnel that perform CT scans are called radiographers or radiology technologists. CT scanners use a rotating X-ray tube and a row of detectors placed in a gantry to measure X-ray attenuations by different tissues inside the body.

Related publications (3)

Microcolumn with variable axis lens for large scan fields and pixel numbers

Chat with Graph Search

Tracking millions of humans

A programmable architecture for the provision of hybrid services

A programmable architecture for the provision of hybrid services